Growth of Atomically Flat-Surface Aluminum Nitride Epitaxial Film by Metalorganic Chemical Vapor Deposition

2005 ◽  
Vol 44 (5A) ◽  
pp. 2987-2992 ◽  
Author(s):  
Kensei Uehara ◽  
Yuji Aota ◽  
Suguru Kameda ◽  
Hiroyuki Nakase ◽  
Yoji Isota ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Aluminum Nitride ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Flat Surface ◽  
Epitaxial Film ◽  
Chemical Vapor ◽  
Atomically Flat ◽  
Metalorganic Chemical

scholarly journals Metalorganic chemical vapor deposition of aluminum nitride on vertical surfaces

2020 ◽  
Vol 531 ◽  
pp. 125345 ◽  
Author(s):  
Elmeri Österlund ◽  
Sami Suihkonen ◽  
Glenn Ross ◽  
Altti Torkkeli ◽  
Heikki Kuisma ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Aluminum Nitride ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

scholarly journals Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride

2001 ◽  
Vol 90 (11) ◽  
pp. 5825-5831 ◽  
Author(s):  
H. Harris ◽  
N. Biswas ◽  
H. Temkin ◽  
S. Gangopadhyay ◽  
M. Strathman
Keyword(s):  
Chemical Vapor Deposition ◽  
Aluminum Nitride ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

Metalorganic chemical vapor deposition of atomically flat SrRuO3 films on stepped SrTiO3 substrates

2005 ◽  
Vol 87 (5) ◽  
pp. 052112 ◽  
Author(s):  
Akihiro Sumi ◽  
Kenji Takahashi ◽  
Shintaro Yokoyama ◽  
Hitoshi Morioka ◽  
Hiroshi Funakubo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Atomically Flat ◽  
Metalorganic Chemical
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