Surface Treatment of Plastic Substrates using Atomic Hydrogen Generated on Heated Tungsten Wire at Low Temperatures

2007 ◽  
Vol 46 (6A) ◽  
pp. 3545-3548 ◽  
Author(s):  
Akira Heya ◽  
Naoto Matsuo
Alloy Digest ◽  
1977 ◽  
Vol 26 (6) ◽  

Abstract TECHALLOY Nickel 200 is commercially pure wrought nickel. It maintains good strength at elevated temperatures and is tough and ductile at low temperatures. It is a general-purpose material when the properties of nickel alloys are not needed. Its many uses include spun and cold-formed parts, electrical components, transducers and nickel-cadmium batteries. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties. It also includes information on forming, heat treating, machining, joining, and surface treatment. Filing Code: Ni-246. Producer or source: Techalloy Company Inc..


Alloy Digest ◽  
1993 ◽  
Vol 42 (11) ◽  

Abstract THYRODUR 2510 (AISI D2) is an oil hardening, non-shrinking die steel which can be hardened at relatively low temperatures. The alloy exhibits excellent wear resistance. This datasheet provides information on composition, physical properties, and hardness. It also includes information on heat treating and surface treatment. Filing Code: TS-521. Producer or source: Thyssen Specialty Steels Inc.


1985 ◽  
Vol 59 ◽  
Author(s):  
S. J. Pearton

ABSTRACTThe ability of hydrogen to migrate in crystalline Si at low temperatures (<400°C) and bond to a variety of both shallow and deep level impurities, passivating their electrical activity, is of fundamental and technological interest. Recent results on the deactivation of the shallow acceptors in Si are compared with similar experiments in other semiconductors, microscopic models are proposed, and the implications for the states of hydrogen in the Si lattice at a variety of temperatures, and the diffusivity of some of these different states, is discussed. New results on the migration of atomic hydrogen under electronic stimulation are also detailed, along with a compendium of the deep levels in Si passivated by reaction with hydrogen. Surface damage by hydrogen-containing plasmas, and the infrared and electrical properties of H-related defect complexes are also reviewed.


1994 ◽  
Vol 194-196 ◽  
pp. 901-902
Author(s):  
T. Arai ◽  
A. Matsubara ◽  
S. Hotta ◽  
J.S. Korhonen ◽  
N. Masuhara ◽  
...  

1986 ◽  
Vol 34 (7) ◽  
pp. 4912-4915 ◽  
Author(s):  
M. W. Reynolds ◽  
I. Shinkoda ◽  
R. W. Cline ◽  
W. N. Hardy

1980 ◽  
Vol 58 (6) ◽  
pp. 881-885 ◽  
Author(s):  
A. J. Berlinsky ◽  
B. Shizgal

Calculations are presented of the low energy (0 < E ≤ 10−2 eV) spin exchange and frequency shift cross sections for (H,H) scattering, and of their thermal averages for 0 < T < 10 K. In particular, the behaviour of the cross sections in this low energy limit and the role of resonances due to orbiting collisions is studied in detail. A comparison is made with recent nmr measurements on gaseous atomic hydrogen at liquid helium temperatures. The results of this work suggest further useful experiments at low temperatures.


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