(Invited) Monolithic Integration of III-V Semiconductors by Selective Area Growth on Si(001) Substrate: Epitaxy Challenges & Applications

2015 ◽  
Vol 66 (4) ◽  
pp. 107-116 ◽  
Author(s):  
C. Merckling ◽  
S. Jiang ◽  
Z. Liu ◽  
N. Waldron ◽  
G. Boccardi ◽  
...  
2013 ◽  
Vol 24 (22) ◽  
pp. 225304 ◽  
Author(s):  
Pratyush Das Kanungo ◽  
Heinz Schmid ◽  
Mikael T Björk ◽  
Lynne M Gignac ◽  
Chris Breslin ◽  
...  

Nanoscale ◽  
2020 ◽  
Vol 12 (46) ◽  
pp. 23780-23788
Author(s):  
Dmitrii V. Viazmitinov ◽  
Yury Berdnikov ◽  
Shima Kadkhodazadeh ◽  
Anna Dragunova ◽  
Nickolay Sibirev ◽  
...  

We report a new approach for monolithic integration of III–V materials into silicon, based on selective area growth and driven by a molten alloy in metal–organic vapor phase epitaxy.


2021 ◽  
Vol 1851 (1) ◽  
pp. 012006
Author(s):  
V O Gridchin ◽  
R R Reznik ◽  
K P Kotlyar ◽  
A S Dragunova ◽  
L N Dvoretckaia ◽  
...  

2021 ◽  
Author(s):  
Pujitha Perla ◽  
H. Aruni Fonseka ◽  
Patrick Zellekens ◽  
Russell Deacon ◽  
Yisong Han ◽  
...  

Nb/InAs-nanowire Josephson junctions are fabricated in situ by a special shadow evaporation scheme for the superconducting Nb electrode. The junctions are interesting candidates for superconducting quantum circuits requiring large magnetic fields.


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