Fully in situ Nb/InAs-nanowire Josephson junctions by selective-area growth and shadow evaporation

Nb/InAs-nanowire Josephson junctions are fabricated in situ by a special shadow evaporation scheme for the superconducting Nb electrode. The junctions are interesting candidates for superconducting quantum circuits requiring large magnetic fields.

Response of a Cold-Electron Bolometer on THz Radiation from a Long YBa2Cu3O7−δ Bicrystal Josephson Junction

The response of the Cold-Electron Bolometers (CEBs), integrated into a 2-D array of dipole antennas, has been measured by irradiation from YBa2Cu3O7−δ (YBCO) 50 μm long Josephson junction into the THz region at frequencies from 0.1 to 0.8 THz. The possibility of controlling the amplitude-frequency characteristic is demonstrated by the external magnetic field in the traveling wave regime of a long Josephson junction. The YBCO junction has been formed on the bicrystal Zr1−xYxO2 (YSZ) substrate by magnetron sputtering and etching of the film. CEBs have been fabricated using an Al multilayer structure by a self-aligned shadow evaporation technique on Si substrate. Both receiver and oscillator have been located inside the same cryostat at 0.3 K and 2.7 K plates, respectively.

THz Properties of Long YBaCuO Bicrystal Josephson Junction Studied with a Cold-Electron Bolometer

The response of the Cold-Electron Bolometers (CEBs), integrated into a 2-D array of dipole antennas, has been measured by irradiation from YBa$_2$Cu$_3$O$_{7-\delta}$ (YBCO) 50 $\mu$m long Josephson junction into the THz region at frequencies from 0.1 to 0.8 THz. The possibility of controlling the amplitude-frequency characteristic is demonstrated by the external magnetic field in the traveling wave regime of a long Josephson junction. YBCO junction has been formed on the bicrystal Zr$_{1-x}$Y$_x$O$_2$ (YSZ) substrate by magnetron sputtering and etching of the film. CEBs have been fabricated using an Al multilayer structure by a self-aligned shadow evaporation technique on Si substrate. Both receiver and oscillator have been located inside the same cryostat at 0.3K and 2.7K plates, respectively.

Graphene Membrane as Suspended Mask for Lithography

Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This technique, which is largely used for realizing mesoscopic devices, where the quality requirements for the junctions prevent the exposure to ambient air and the occurrence of quantum phenomena requires highly defined structures, can be improved by the use of pure 2-dimensional masks, like graphene ones. Advantages and differences of this material with respect to commonly employed polymers are presented and discussed.