Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Insituinvestigation of the growth of rf glow‐discharge deposited amorphous germanium and silicon films

1987 ◽  
Vol 61 (7) ◽  
pp. 2501-2508 ◽  
Author(s):  
A. M. Antoine ◽  
B. Drevillon ◽  
P. Roca i Cabarrocas
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Amorphous Germanium ◽  
Rf Glow Discharge

Low-temperature growth of microcrystalline silicon using 100% by rf glow discharge method

1996 ◽  
Vol 29 (6) ◽  
pp. 1636-1640 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoshinori Hatanaka ◽  
Yoichiro Nakanishi ◽  
Kenji Ishikawa
Keyword(s):  
Low Temperature ◽  
Glow Discharge ◽  
Microcrystalline Silicon ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Rf Glow Discharge ◽  
Discharge Method

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

2004 ◽  
Vol 457 (1) ◽  
pp. 84-89 ◽  
Author(s):  
Chisato Niikura ◽  
Naho Itagaki ◽  
Michio Kondo ◽  
Yoshinobu Kawai ◽  
Akihisa Matsuda
Keyword(s):  
Glow Discharge ◽  
Discharge Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Glow Discharge Plasma ◽  
Microcrystalline Silicon
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