Optical and transport studies on thin microcrystalline silicon films prepared by very high frequency glow discharge for solar cell applications

Journal of Applied Physics ◽

10.1063/1.365354 ◽

1997 ◽

Vol 81 (11) ◽

pp. 7376-7385 ◽

Author(s):

M. Tzolov ◽

F. Finger ◽

R. Carius ◽

P. Hapke

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Transport Studies ◽

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Optical emission spectroscopy investigation on very high frequency plasma and its glow discharge mechanism during the microcrystalline silicon deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.06.130 ◽

2005 ◽

Vol 472 (1-2) ◽

pp. 125-129 ◽

Author(s):

Huidong Yang ◽

Chunya Wu ◽

Junkai Huang ◽

Ruiqin Ding ◽

Ying Zhao ◽

...

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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The microstructure and optical properties of crystallized hydrogenated silicon films prepared by very high frequency glow discharge

Applied Surface Science ◽

10.1016/j.apsusc.2011.03.136 ◽

2011 ◽

Vol 257 (20) ◽

pp. 8350-8354 ◽

Author(s):

Desheng Wang ◽

Zhibo Yang ◽

Fei Li ◽

Deyan He

Keyword(s):

Optical Properties ◽

Glow Discharge ◽

High Frequency ◽

Silicon Films ◽

Very High Frequency ◽

Hydrogenated Silicon ◽

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Preparation of Microcrystalline Silicon Films by Very-High-Frequency Digital Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.1948 ◽

1992 ◽

Vol 31 (Part 1, No. 6B) ◽

pp. 1948-1952 ◽

Author(s):

Masanori Otobe ◽

Shunri Oda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

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Electrical properties and degradation kinetics of compensated hydrogenated microcrystalline silicon deposited by very high‐frequency‐glow discharge

Journal of Applied Physics ◽

10.1063/1.358992 ◽

1995 ◽

Vol 77 (2) ◽

pp. 712-716 ◽

Author(s):

R. Flückiger ◽

J. Meier ◽

M. Goetz ◽

A. Shah

Keyword(s):

Electrical Properties ◽

Glow Discharge ◽

High Frequency ◽

Degradation Kinetics ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Kinetics Of ◽

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Evolution of the microstructure in microcrystalline silicon prepared by very high frequency glow-discharge using hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.372311 ◽

2000 ◽

Vol 87 (6) ◽

pp. 3137-3142 ◽

Author(s):

E. Vallat-Sauvain ◽

U. Kroll ◽

J. Meier ◽

A. Shah ◽

J. Pohl

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Hydrogen Dilution ◽

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Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics

Materials Science and Engineering B ◽

10.1016/s0921-5107(99)00299-8 ◽

2000 ◽

Vol 69-70 ◽

pp. 219-226 ◽

Author(s):

A. Shah ◽

E. Vallat-Sauvain ◽

P. Torres ◽

J. Meier ◽

U. Kroll ◽

...

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

New Material ◽

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The application of very high frequency inductively coupled plasma to high-rate growth of microcrystalline silicon films

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2005.11.125 ◽

2006 ◽

Vol 352 (9-20) ◽

pp. 911-914 ◽

Author(s):

Nihan Kosku ◽

Seiichi Miyazaki

Keyword(s):

High Frequency ◽

Inductively Coupled Plasma ◽

Silicon Films ◽

High Rate ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Inductively Coupled ◽

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Free-carrier absorption in microcrystalline silicon thin films prepared by very-high-frequency glow discharge

Philosophical Magazine B ◽

10.1080/01418639408240103 ◽

1994 ◽

Vol 69 (2) ◽

pp. 197-207 ◽

Author(s):

K. Peter ◽

G. Willeke ◽

K. Prasad ◽

A. Shah ◽

E. Bucher

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Free Carrier ◽

Free Carrier Absorption ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Silicon Thin Films ◽

Carrier Absorption ◽

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Microstructure and surface roughness of microcrystalline silicon prepared by very high frequency-glow discharge using hydrogen dilution

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00769-3 ◽

2000 ◽

Vol 266-269 ◽

pp. 125-130 ◽

Author(s):

E Vallat-Sauvain ◽

U Kroll ◽

J Meier ◽

N Wyrsch ◽

A Shah

Keyword(s):

Surface Roughness ◽

Glow Discharge ◽

High Frequency ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Hydrogen Dilution ◽

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Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow discharge

Applied Physics Letters ◽

10.1063/1.112604 ◽

1994 ◽

Vol 65 (20) ◽

pp. 2588-2590 ◽

Author(s):

F. Finger ◽

P. Hapke ◽

M. Luysberg ◽

R. Carius ◽

H. Wagner ◽

...

Keyword(s):

Glow Discharge ◽

Deposition Rate ◽

High Frequency ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

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