Vapor Growth of a Semiconductor Superlattice

1971 ◽  
Vol 118 (9) ◽  
pp. 1459 ◽  
Author(s):  
A. E. Blakeslee
1986 ◽  
Vol 57 (3) ◽  
pp. 380-383 ◽  
Author(s):  
Pawel Hawrylak ◽  
John J. Quinn

1988 ◽  
Vol 147 (1) ◽  
pp. 141-148 ◽  
Author(s):  
K. Yonashiro ◽  
T. Tomoyose ◽  
M. Yamshiro ◽  
M. Kobayashi

Langmuir ◽  
2003 ◽  
Vol 19 (12) ◽  
pp. 4871-4875 ◽  
Author(s):  
F. Nüesch ◽  
M. Carrara ◽  
L. Zuppiroli

1985 ◽  
Vol 56 ◽  
Author(s):  
F.-C. Su ◽  
S. Levine ◽  
P. E. Vanier ◽  
F. J. Kampas

AbstractAmorphous semiconductor superlattice structures consisting of alternating n-type and p-type doped layers of hydrogenated amorphous silicon (a-Si:H) have been made by silane glow discharge in a single chamber system. These multilayered films show the novel phenomenon of light-induced excess conductivity (LEC) associated with a metastable state having a lifetime of order of days. This report shows that the LEC effect is quite dependent on the specific details of the deposition parameters, namely dilution of the silane with inert gas, substrate temperature and layer thickness. In order to investigate the origin of the LEC effect, argon dilution was used for specific regions of the structure. This experiment shows that the slow states are distributed throughout the layers, and are not concentrated at the interfaces.


1977 ◽  
Vol 42 ◽  
pp. 160-165 ◽  
Author(s):  
L. Van Den Berg ◽  
W.F. Schnepple ◽  
C. Ortale ◽  
M. Schieber

1994 ◽  
Vol 37 (4-6) ◽  
pp. 1321-1326 ◽  
Author(s):  
Christian Waschke ◽  
Patrick Leisching ◽  
Peter Haring Bolivar ◽  
Ralf Schwedler ◽  
Frank Brüggemann ◽  
...  

1966 ◽  
Vol 113 (5) ◽  
pp. 467 ◽  
Author(s):  
F. J. Reid ◽  
S. E. Miller ◽  
H. L. Goering
Keyword(s):  

1975 ◽  
Vol 48 (11) ◽  
pp. 3156-3160 ◽  
Author(s):  
Seiji Motojima ◽  
Fumio Sugimori ◽  
Yasutaka Takahashi ◽  
Kohzo Sugiyama

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