Effect of Exposure to Ultraviolet-Activated Oxygen on the Electrical Characteristics of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors
2013 ◽
Vol 2
(4)
◽
pp. Q21-Q24
◽
P. Liu
◽
T. P. Chen
◽
X. D. Li
◽
Z. Liu
◽
J. I. Wong
◽
...
2020 ◽
Vol MA2020-02
(28)
◽
pp. 1929-1929
Seung-Ryum Baek
◽
Tae-Yeon Seong
2017 ◽
Vol 9
(15)
◽
pp. 13278-13285
◽
Kwan Yup Shin
◽
Young Jun Tak
◽
Won-Gi Kim
◽
Seonghwan Hong
◽
Hyun Jae Kim
2013 ◽
Vol 8
(4)
◽
pp. 361-365
◽
Sheng-Po Chang
◽
Tsung-Han Yang
◽
Chao-Jen Ho
◽
Shoou-Jinn Chang
Abdelhafid Marroun
◽
Naima Amar Touhami
◽
Taj-eddin El Hamadi
2017 ◽
Vol 135
◽
pp. 43-48
◽
M. Estrada
◽
Y. Hernandez-Barrios
◽
A. Cerdeira
◽
F. Ávila-Herrera
◽
J. Tinoco
◽
...
2021 ◽
Vol 13
(3)
◽
pp. 4110-4116
Chan Sic Yoon
◽
Hyung Tae Kim
◽
Min Seong Kim
◽
Hyukjoon Yoo
◽
Jeong Woo Park
◽
...
2011 ◽
Vol 86
(3)
◽
pp. 246-249
◽
C.J. Chiu
◽
Z.W. Pei
◽
S.T. Chang
◽
S.P. Chang
◽
S.J. Chang
2011 ◽
Vol 520
(5)
◽
pp. 1608-1611
◽
Geng-Wei Chang
◽
Ting-Chang Chang
◽
Yong-En Syu
◽
Tsung-Ming Tsai
◽
Kuan-Chang Chang
◽
...
2015 ◽
Vol 135
(6)
◽
pp. 192-198
◽
Shinnosuke Iwamatsu
◽
Yutaka Abe
◽
Toru Yahagi
◽
Seiya Kobayashi
◽
Kazushige Takechi
◽
...
Donghee Choi
◽
Byoungdeog Choi