AbstractA multi–layer gadolinium–doped yttrium oxide thin film was deposited in a combinatorial fashion on a Si (001) substrate using radio–frequency magnetron sputtering. Alternating layers of Y2O3 and Gd were deposited for a total of 9 layers. The film was homogenized in composition by an 850°C 12 hour thermal treatment producing a range of composition from Y1.96Gd0.04O3-Y1.54Gd0.46O3 in a single film. Ultraviolet emission with a peak wavelength at 314-315nm was observed from the gadolinium 8S7/2 - 6P7/2 transition via cathodoluminescence (CL) excitation. The CL–induced intensity was found to be maximum at 9 at% Gd (Y1.82Gd0.18O3) and an optimized electron probe of Vacc = 13 keV was determined for the 1 μm thick thin film. Gadolinium activator saturation was observed for sample current density greater than 0.03 μA/cm2. Non- radiative decay via thermal pathways is suspected for the observed activator saturation.
Electrochemical Performance of Iridium Oxide Thin Film for Supercapacitor
Prepared by Radio Frequency Magnetron Sputtering Method
