Corrosion Protection with Ultrathin Oxide Coatings Grown by Atomic Layer Deposition

2013 ◽  
Vol 3 (10) ◽  
pp. 1308-1315 ◽  
Author(s):  
Hyea Kim ◽  
Jung Tae Lee ◽  
Dong-Chan Lee ◽  
Alexandre Magasinski ◽  
Won-il Cho ◽  
...  

2019 ◽  
Vol 37 (6) ◽  
pp. 060902 ◽  
Author(s):  
Véronique Cremers ◽  
Geert Rampelberg ◽  
Kitty Baert ◽  
Shoshan Abrahami ◽  
Nathalie Claes ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (92) ◽  
pp. 50503-50509 ◽  
Author(s):  
Zhimin Chai ◽  
Yuhong Liu ◽  
Jing Li ◽  
Xinchun Lu ◽  
Dannong He

Ultra-thin Al2O3 films with thickness in the range of 4.5–29.4 nm were prepared on a copper substrate by atomic layer deposition (ALD) at the temperature of 150 °C to protect the substrate from corrosion.


2012 ◽  
Vol 522 ◽  
pp. 283-288 ◽  
Author(s):  
E. Marin ◽  
L. Guzman ◽  
A. Lanzutti ◽  
W. Ensinger ◽  
L. Fedrizzi

2015 ◽  
Vol 162 (8) ◽  
pp. C377-C384 ◽  
Author(s):  
Shadi Mirhashemihaghighi ◽  
Jolanta Światowska ◽  
Vincent Maurice ◽  
Antoine Seyeux ◽  
Lorena H. Klein ◽  
...  

2017 ◽  
Vol 9 (4) ◽  
pp. 4192-4201 ◽  
Author(s):  
James S. Daubert ◽  
Grant T. Hill ◽  
Hannah N. Gotsch ◽  
Antoine P. Gremaud ◽  
Jennifer S. Ovental ◽  
...  

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