Ultra-thin hafnium oxide coatings grown by atomic layer deposition: hydrophobicity/hydrophilicity over time

Preparation of Hafnium Oxide Thin Films grown by Atomic Layer Deposition

Korean Journal of Materials Research ◽

10.3740/mrsk.2005.15.4.275 ◽

2005 ◽

Vol 15 (4) ◽

pp. 275-280

Author(s):

Hie-Chul Kim ◽

Min-Wan Kim ◽

Hyung-Su Kim ◽

Hyug-Jong Kim ◽

Woo-Keun Sohn ◽

...

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Atomic Layer ◽

Oxide Thin Films ◽

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

10.1063/1.1515107 ◽

2002 ◽

Vol 92 (10) ◽

pp. 5698-5703 ◽

Cited By ~ 49

Author(s):

Kaupo Kukli ◽

Mikko Ritala ◽

Jonas Sundqvist ◽

Jaan Aarik ◽

Jun Lu ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Oxide Films ◽

Atomic Layer ◽

Insights into the passivation effect of atomic layer deposited hafnium oxide for efficiency and stability enhancement in organic solar cells

Journal of Materials Chemistry C ◽

10.1039/c8tc02243g ◽

2018 ◽

Vol 6 (30) ◽

pp. 8051-8059 ◽

Cited By ~ 10

Author(s):

Ermioni Polydorou ◽

Martha Botzakaki ◽

Charalampos Drivas ◽

Kostas Seintis ◽

Ilias Sakellis ◽

...

Keyword(s):

Solar Cells ◽

Atomic Layer Deposition ◽

Organic Solar Cells ◽

Hafnium Oxide ◽

Atomic Layer ◽

Layer Deposition ◽

Stability Enhancement

Atomic layer deposition of HfO2 significantly increases the efficiency and prolongs the lifetime of organic solar cells.

The pH sensing electrochemical characteristics of a thin-layer hafnium oxide field-effect transistor formed by atomic layer deposition

Instrumentation et Interdisciplinarité ◽

10.1051/978-2-7598-1206-6-044 ◽

2020 ◽

pp. 351-358

Author(s):

Michael Lee ◽

Abdoullatif Baraket ◽

Nadia Zine ◽

Miguel Zabala ◽

Francesca Campabadal ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Thin Layer ◽

Hafnium Oxide ◽

Field Effect ◽

Field Effect Transistor ◽

Atomic Layer ◽

Electrochemical Characteristics ◽

Ph Sensing ◽

Layer Deposition ◽

Effect Transistor

The effects of annealing and wake-up cycling on the ferroelectricity of zirconium hafnium oxide ultrathin films prepared by remote plasma atomic layer deposition

Smart Materials and Structures ◽

10.1088/1361-665x/ab23c3 ◽

2019 ◽

Vol 28 (8) ◽

pp. 084005 ◽

Cited By ~ 2

Author(s):

Tzu-Yao Hsu ◽

Chin-Lung Kuo ◽

Bo-Ting Lin ◽

Jay Shieh ◽

Miin-Jang Chen

Keyword(s):

Atomic Layer Deposition ◽

Ultrathin Films ◽

Hafnium Oxide ◽

Atomic Layer ◽

Remote Plasma ◽

Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

10.1063/1.1895475 ◽

2005 ◽

Vol 97 (9) ◽

pp. 099903 ◽

Cited By ~ 1

Author(s):

Kaupo Kukli ◽

Jaan Aarik ◽

Mikko Ritala ◽

Teet Uustare ◽

Timo Sajavaara ◽

...

Keyword(s):

Dielectric Properties ◽

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Oxide Films ◽

Atomic Layer ◽

Deposition Parameters ◽

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

10.1063/1.1796513 ◽

2004 ◽

Vol 96 (9) ◽

pp. 5298-5307 ◽

Cited By ~ 51

Author(s):

Kaupo Kukli ◽

Jaan Aarik ◽

Mikko Ritala ◽

Teet Uustare ◽

Timo Sajavaara ◽

...

Keyword(s):

Dielectric Properties ◽

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Oxide Films ◽

Atomic Layer ◽

Deposition Parameters ◽

Reply to “Comment on ‘Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water” ’ [J. Appl. Phys. 95, 4777 (2004)]

10.1063/1.1943503 ◽

2005 ◽

Vol 98 (1) ◽

pp. 016102 ◽

Cited By ~ 1

Author(s):

Riikka L. Puurunen

Keyword(s):

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Atomic Layer ◽

Hydroxyl Group ◽

Hafnium Tetrachloride ◽

Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1781183 ◽

2004 ◽

Vol 22 (5) ◽

pp. 2035-2040 ◽

Cited By ~ 29

Author(s):

Anand Deshpande ◽

Ronald Inman ◽

Gregory Jursich ◽

Christos Takoudis

Keyword(s):

Water Vapor ◽

Atomic Layer Deposition ◽

Hafnium Oxide ◽

Atomic Layer ◽

Commonalities of Atomic Layer Deposition of Oxide Coatings on Activated Carbons for 3.5 V Electric Double Layer Supercapacitors

Frontiers in Energy Research ◽

10.3389/fenrg.2020.596062 ◽

2020 ◽

Vol 8 ◽

Author(s):

Daniel Q. Tan ◽

Guanghui Song ◽

Dayakar Gandla ◽

Fuming Zhang

Keyword(s):

Atomic Layer Deposition ◽

Double Layer ◽

Electric Double Layer ◽

Activated Carbons ◽

Atomic Layer ◽

Oxide Coatings ◽