Multilayer Al2O3/TiO2 Atomic Layer Deposition coatings for the corrosion protection of stainless steel

2012 ◽  
Vol 522 ◽  
pp. 283-288 ◽  
Author(s):  
E. Marin ◽  
L. Guzman ◽  
A. Lanzutti ◽  
W. Ensinger ◽  
L. Fedrizzi
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Atomic Layer ◽  
Layer Deposition

Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

2011 ◽  
Vol 104 (1-2) ◽  
pp. 6-11 ◽  
Author(s):  
Hyemin Kang ◽  
Chang-Soo Lee ◽  
Do-Young Kim ◽  
Jungwon Kim ◽  
Wonyong Choi ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Photocatalytic Effect ◽  
Layer Deposition

Atomic Layer Deposition of Lithium-Silicon-Tin Oxide Nanofilms for High Performance Thin Film Batteries Anodes

2020 ◽  
Vol 299 ◽  
pp. 1058-1063
Author(s):  
Denis Nazarov ◽  
Ilya Mitrofanov ◽  
Maxim Yu. Maximov
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Spectral Ellipsometry ◽  
X Ray ◽  
Layer Deposition

Tin oxide is the most promising material for thin film anodes of Li-ion batteries due to its cycling performance and high theoretical capacity. It is assumed that lithium-tin oxide can demonstrate even higher performance. Lithium-silicon-tin oxide nanofilms were prepared by atomic layer deposition (ALD), using the lithium bis (trimethylsilyl) amide (LiHMDS), tetraethyltin (TET) as a metal containing reagents and ozone or water or oxygen plasma as counter-reactants. Monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thicknesses of the nanofilms were measured by spectral ellipsometry (SE) and scanning electron microscopy (SEM). It was found that oxygen plasma is the most optimal ALD counter-reactant. The composition and structure were studied by Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The nanofilms contain silicon as impurity, whose source is the ALD precursor (LiHMDS). The nanofilms deposited on stainless steel have shown the high Coulombic efficiency (99.1-99.8%) and cycling performance at a relatively high voltage (0.01 to 2.0V).

scholarly journals Corrosion protection of Cu by atomic layer deposition

2019 ◽  
Vol 37 (6) ◽  
pp. 060902 ◽  
Author(s):  
Véronique Cremers ◽  
Geert Rampelberg ◽  
Kitty Baert ◽  
Shoshan Abrahami ◽  
Nathalie Claes ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Atomic Layer ◽  
Layer Deposition

Ultra-thin Al2O3 films grown by atomic layer deposition for corrosion protection of copper

RSC Advances ◽  
2014 ◽  
Vol 4 (92) ◽  
pp. 50503-50509 ◽  
Author(s):  
Zhimin Chai ◽  
Yuhong Liu ◽  
Jing Li ◽  
Xinchun Lu ◽  
Dannong He
Keyword(s):  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Copper Substrate ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films

Ultra-thin Al2O3 films with thickness in the range of 4.5–29.4 nm were prepared on a copper substrate by atomic layer deposition (ALD) at the temperature of 150 °C to protect the substrate from corrosion.

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

2015 ◽  
Vol 162 (8) ◽  
pp. C377-C384 ◽  
Author(s):  
Shadi Mirhashemihaghighi ◽  
Jolanta Światowska ◽  
Vincent Maurice ◽  
Antoine Seyeux ◽  
Lorena H. Klein ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Surface Analysis ◽  
Atomic Layer ◽  
Alumina Coatings ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document