High Performance Micro-Crystalline Silicon TFT Using Indirect Thermal Crystallization Technique

2019 ◽  
Vol 33 (5) ◽  
pp. 213-216 ◽  
Author(s):  
Byung Gook Choi ◽  
Ki-Tae Kim ◽  
Jun Hyeon Bae ◽  
Sul Lee ◽  
Hong Koo Lee ◽  
...  

2020 ◽  
Vol 542 ◽  
pp. 125666 ◽  
Author(s):  
Qi Lei ◽  
Liang He ◽  
Senlin Rao ◽  
Changxin Tang ◽  
Liang Ming ◽  
...  

2019 ◽  
Vol 960 ◽  
pp. 263-267
Author(s):  
Huan Liu ◽  
Lei Zhao ◽  
Hong Wei Diao ◽  
Wen Jing Wang

It was found that the addition of MnO2 particles into the HF/HNO3/H2O system could significantly improve the texturization etching performance on multi-crystalline silicon (mc-Si) wafer. For a wide component ratio range of HF/HNO3/H2O from HF-rich to HNO3-rich, by optimizing the MnO2 usage and the etching time, the addition of MnO2 particles always reduced the texture reflectance greatly. Low weighted average surface reflectance (Ra) for the AM1.5G sun spectrum in the wavelength range of 380–1100 nm was achieved on both the slurry wire sliced (SWS) mc-Si and the diamond wire sliced (DWS) mc-Si. Due to its excellent effect and simple processing, the MnO2/HF/HNO3/H2O etching system can be expected as a candidate for high-performance texturization on mc-Si wafer, especially on DWS mc-Si wafer.


2015 ◽  
Vol 2 (6) ◽  
pp. 065902 ◽  
Author(s):  
Jian He ◽  
Pingqi Gao ◽  
Jiang Sheng ◽  
Xi Yang ◽  
Suqiong Zhou ◽  
...  

1995 ◽  
Vol 31 (24) ◽  
pp. 2123-2124 ◽  
Author(s):  
Li-Hong Laih ◽  
Jyh-Wong Hong ◽  
Tean-Sen Jen ◽  
Rong-Heng Yuang ◽  
Wen-Chin Tsay ◽  
...  

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