scholarly journals Structural, Optical, and Electrochromic Properties of Pure and Mo-Doped WO3 Films by RF Magnetron Sputtering

2013 ◽  
Vol 2013 ◽  
pp. 1-5 ◽  
Author(s):  
Vempuluri Madhavi ◽  
Paruchuri Kondaiah ◽  
Obili Mahammad Hussain ◽  
Suda Uthanna
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Orthorhombic Phase ◽  
Rf Magnetron Sputtering ◽  
Optical Transmittance ◽  
Optical Modulation ◽  
Coated Glass Substrate ◽  
Electrochromic Properties ◽  
Cyclic Voltametry ◽  
Near Ir

Pure and Mo-doped WO3 films were formed on ITO-coated glass substrate held at 473 K by RF magnetron sputtering technique. The structural, morphological, and optical properties of pure and Mo-doped WO3 thin films have been systematically studied. The structural properties revealed that the pure WO3 films exhibited a (020) reflection related to the orthorhombic phase of WO3, whereas Mo-doped films showed (200) reflection. The surface morphology revealed that pure WO3 films showed the dense surface and Mo-doped films contained agglomerated grains which were uniformly distributed on the surface of the substrate. The optical transmittance decreased from 85% to 75% for pure and Mo-doped WO3 films, respectively. The electrochromic properties of the films were measured by cyclic voltametry in 1 M Li2SO4 electrolyte solution. The optical modulation of pure WO3 films at near IR was 50%, and the calculated color efficiency was 33.8 cm2/C, while in Mo-doped WO3 the efficiency improved to 42.5 cm2/C.

Study on Relaxor Ferroelectric Thin Films of Tungsten Bronze Pb1-xBaxNb2O6 by RF Magnetron Sputtering

1997 ◽  
Vol 472 ◽  
Author(s):  
X. Xiao ◽  
N. Xu ◽  
L. Li
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Ferroelectric Properties ◽  
Tungsten Bronze ◽  
Orthorhombic Phase ◽  
Rf Magnetron Sputtering ◽  
Ferroelectric Thin Films ◽  
Sputtering Deposition ◽  
Excess Amount ◽  
Lead Barium Niobate

ABSTRACTFerroelectric thin films of tungsten bronze lead barium niobáte (PBN) were fabricated by radio frequency magnetron sputtering. Oriented growths of the thin films were observed along (001) in tetragonal phase and along (002) in orthorhombic phase. Excess amount of PbO (6 wt %) in the PBN targets were used to compensate Pb evaporation during sputtering deposition. Ferroelectric properties were investigated as a function of annealing temperatures. The thin film with high quality was annealed at 650 °C, while its remnant polarization (Pr) and coercive field (Ec) were equal to 47.9 μC/cm2 and 5.2 kV/cm, respectively.

Single Crystal, High Band Gap CdS Thin Films Grown by RF Magnetron Sputtering in Argon Atmosphere for Solar Cell Applications

2018 ◽  
Vol 10 (3) ◽  
pp. 03005-1-03005-6 ◽  
Author(s):  
Rupali Kulkarni ◽  
◽  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhawar ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Magnetron Sputtering ◽  
Single Crystal ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Argon Atmosphere ◽  
Cds Thin Films ◽  
High Band

Characteristics of Ion Beam Assisted ITO Thin Films Deposited by RF Magnetron Sputtering

2014 ◽  
Vol 601 (1) ◽  
pp. 57-63 ◽  
Author(s):  
Kyong Chan Heo ◽  
Phil Kook Son ◽  
Youngku Sohn ◽  
Jonghoon Yi ◽  
Jin Hyuk Kwon ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Ion Beam ◽  
Rf Magnetron Sputtering ◽  
Ito Thin Films

Substrate Temperature and La0.9Sr0.1Ga0.8Mg0.2O3-δ Electrolyte Film Growth by Radio Frequency Magnetron Sputtering

2015 ◽  
Vol 833 ◽  
pp. 127-133
Author(s):  
Jie Yu ◽  
Jie Xing ◽  
Xiu Hua Chen ◽  
Wen Hui Ma ◽  
Rui Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Radio Frequency ◽  
Film Growth ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Electrolyte Film ◽  
Porous Anode

La0.9Sr0.1Ga0.8Mg0.2O3-δ (LSGM) electrolyte thin films were fabricated on La0.7Sr0.3Cr0.5Mn0.5O2.75 (LSCM) porous anode substrates by Radio Frequency (RF) magnetron sputtering method. The compatibility between LSGM and LSCM was examined. Microstructures of LSGM thin films fabricated were observed by scanning electron microscope (SEM). The effect of substrate temperature on LSGM thin films was clarified by X-ray Diffraction (XRD). Deposition rate increases firstly at the range of 50°C~150°C, and then decreases at the range of 150°C ~300°C. After annealing, perovskite structure with the same growth orientation forms at different substrate temperature. Crystallite size decreases at first, to the minimum point at 150°C, then increases as substrate temperature rises.

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