Development of UV Light Irradiation Patterning of Bacteriorhodopsin Thin Films for Biomimetic Functional Devices

2016 ◽  
Vol 16 (4) ◽  
pp. 3420-3425 ◽  
Author(s):  
Yoshihiro Haruyama ◽  
Katsuyuki Kasai ◽  
Toshiki Yamada ◽  
Shukichi Tanaka ◽  
Yukihiro Tominari ◽  
...  

We developed a new patterning method for bacteriorhodopsin (bR) thin films using UV light irradiation. The proton pump function of bR thin films can be deactivated with UV light irradiation. Inactivation of the proton pump function of bR is related to structural changes or photo-bleaching of the retinal in bR using UV light exposure, which was confirmed with absorption and Raman spectroscopy measurements. Utilizing inactivation of the proton pump function with UV light irradiation, we prepared a bR photocell with a stripe-patterned bR thin film and measured its photocurrent response. The new patterning method is applicable to complicated patterning and patterning with a higher spatial resolution, which extends the application of bR thin films as sensor devices.

2021 ◽  
Vol 553 ◽  
pp. 149535
Author(s):  
Elisa Moretti ◽  
Elti Cattaruzza ◽  
Cristina Flora ◽  
Aldo Talon ◽  
Eugenio Casini ◽  
...  

1991 ◽  
Vol 27 (2) ◽  
pp. 1544-1547 ◽  
Author(s):  
A. Enokihara ◽  
S. Kohiki ◽  
H. Higashino ◽  
K. Setsune ◽  
K. Wasa

1993 ◽  
Vol 137-139 ◽  
pp. 153-164
Author(s):  
Akira Enokihara ◽  
Shigemi Kohiki ◽  
Kentaro Setsune ◽  
Kiyotaka Wasa

2007 ◽  
Vol 127 ◽  
pp. 221-226
Author(s):  
Kiyozumi Niizuma ◽  
Takahiro Hayakawa ◽  
Yoshio Utsushikawa

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ゚, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω・m to 1.4×10-2Ω・m with UV light irradiation.


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