Adherent diamond coating deposited on Ti by ultrasonic after carbonization pretreatment

2019 ◽  
pp. 095440541988478
Author(s):  
Jiye Gao ◽  
Feng Xu ◽  
Zhenyu Ma ◽  
Lili Shi ◽  
Xue Wang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Carbide ◽  
Vapor Deposition ◽  
Film Growth ◽  
High Surface ◽  
Chemical Vapor ◽  
Porous Titanium ◽  
Diamond Coating ◽  
Diamond Coatings ◽  
Hot Filament

The adhesion of wear-resistant diamond coating deposited on titanium was weakened by the porous titanium carbide interlayer, which was formed before film growth. In order to enhance substrate-coating adherence, a new pretreatment method was presented: Ti substrates were carbonized by hot filament chemical vapor deposition system, and then the carbonized substrates were ultrasonically vibrated using diamond micro-powder suspension. Diamond coatings were deposited by hot filament chemical vapor deposition as well. The effect of carbonization time on adhesion was investigated. The carbonized substrates and the interface between diamond coatings and substrates were characterized. The results showed that as the carbonization time increases, porous structures and cracks appear and increase on the surface of the substrate. The carbonized substrates possess high surface energy and thus the nucleation is promoted. After deposition, a dense and thin titanium carbide was observed. Ultrasonic after carbonization pretreatment can significantly enhance the adhesion of Ti-based diamond coatings by promoting nucleation and suppressing the formation of porous titanium carbide.

Cubic Silicon Carbite Film Growth and Characterization by Hot Filament Chemical Vapor Deposition

1994 ◽  
Vol 11 (11) ◽  
pp. 709-712 ◽  
Author(s):  
Hongtao Shi ◽  
Rong Zhang ◽  
Youdou Zheng ◽  
Yuliang He ◽  
Xiangna Liu
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hot Filament

Growth and characterization of multilayer hot-filament chemical vapor deposition diamond coatings on WC–Co substrates

2019 ◽  
Vol 7 (1) ◽  
pp. 36-43 ◽  
Author(s):  
José Vieira ◽  
André Contin ◽  
Mariana Amorim Fraga ◽  
Evaldo José Corat ◽  
Vladimir Trava Airoldi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Diamond Coatings ◽  
Hot Filament

High efficiency deposition of diamond film by hot filament chemical vapor deposition

1996 ◽  
Vol 11 (12) ◽  
pp. 2957-2960 ◽  
Author(s):  
Yan Chen ◽  
Qijin Chen ◽  
Zhangda Lin
Keyword(s):  
Growth Rate ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Film Growth ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Reaction Chamber ◽  
Deposition Area ◽  
Hot Filament

A new designed reaction chamber with new relative distribution of filament and substrates has been adopted in order to increase the deposition area of diamond films and thus increase the deposition efficiency in conventional hot filament chemical vapor deposition (HFCVD) systems. The relatively small reaction chamber was cuboid shaped (50 × 25 × 25 mm3) and composed of molybdenum wafers. It was established in the vacuum chamber. A tungsten filament was hung up vertically in the center of the small chamber and parallel to the gas flow path. At the four inner sides of the reaction chamber, four Si(100) substrates (30 × 10 × 0.5 mm3) were installed to grow diamond films. The deposition results indicate that uniform diamond films can be obtained on the four substrates, and the film growth rate is the same at both ends of the substrates. The diamond film growth rate was about 1−2 μm/h, which is similar to those of the conventional HFCVD method. Thus, the deposition area and efficiency can be increased four times in the case without the filament number, gas flow rate, and power consumption.

scholarly journals Single-Crystal Diamond Needle Fabrication Using Hot-Filament Chemical Vapor Deposition

Materials ◽  
2021 ◽  
Vol 14 (9) ◽  
pp. 2320
Author(s):  
Rinat Ismagilov ◽  
Sergei Malykhin ◽  
Aleksey Puzyr ◽  
Artem Loginov ◽  
Victor Kleshch ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Practical Application ◽  
Single Crystal Diamond ◽  
Diamond Film Growth ◽  
Hot Filament ◽  
Micrometer Scale

Single-crystal diamonds in the form of micrometer-scale pyramids were produced using a combination of hot-filament (HF) chemical vapor deposition (CVD) and thermal oxidation processes. The diamond pyramids were compared here with similar ones that were manufactured using plasma-enhanced (PE) CVD. The similarities revealed in the morphology, Raman, and photoluminescent characteristics of the needles obtained using the hot-filament and plasma-enhanced CVD are discussed in connection with the diamond film growth mechanism. This work demonstrated that the HF CVD method has convincing potential for the fabrication of single-crystal diamond needles in the form of regularly shaped pyramids on a large surface area, even on non-conducting substrates. The experimental results demonstrated the ability for the mass production of the single-crystal needle-like diamonds, which is important for their practical application.

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