Hot‐filament‐activated chemical‐vapor deposition of carbon: Film growth and filament reactions

1994 ◽  
Vol 76 (2) ◽  
pp. 1220-1227 ◽  
Author(s):  
Robert R. Rye
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Hot Filament

Microstructure of Carbon Film Deposited Using Hot-Filament Chemical Vapor Deposition

2015 ◽  
Vol 48 (6) ◽  
pp. 104-109
Author(s):  
Youn-Joon Baik ◽  
Do-Hyun Kwon ◽  
Jong-Keuk Park ◽  
Wook-Seong Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Hot Filament

Effect of Sub-Micron Thin Film on Surface Temperature During Chemical Vapor Deposition

2005 ◽  
Author(s):  
Wei Huang ◽  
Weixue Tian ◽  
Wilson K. S. Chiu
Keyword(s):  
Heat Transfer ◽  
Chemical Vapor Deposition ◽  
Optical Fiber ◽  
Vapor Deposition ◽  
Film Growth ◽  
Radiation Heat Transfer ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Operating Conditions ◽  
Effective Emissivity

In this paper, we investigated the effect of the film thickness on heat transfer and subsequent film temperature distribution of an optical fiber as it traverses through a chemical vapor deposition (CVD) reactor. A 50 nm thick carbon coating is applied on the optical fiber as it moves through the CVD reactor. In this process, the only heat source is the hot optical fiber entering the CVD reactor from the draw furnace. Radiation heat transfer from the optical fiber as it is being coated plays an important role during CVD carbon film growth. The carbon film will change the effective emissivity of the optical fiber as it traverses through the CVD reactor. This study will calculate the effective emissivity of this film-fiber structure based on wave theory, and evaluate the optical fiber’s resulting temperature field and rate of heat transfer loss during chemical vapor deposition. Results are correlated to operating conditions.

Adherent diamond coating deposited on Ti by ultrasonic after carbonization pretreatment

2019 ◽  
pp. 095440541988478
Author(s):  
Jiye Gao ◽  
Feng Xu ◽  
Zhenyu Ma ◽  
Lili Shi ◽  
Xue Wang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Carbide ◽  
Vapor Deposition ◽  
Film Growth ◽  
High Surface ◽  
Chemical Vapor ◽  
Porous Titanium ◽  
Diamond Coating ◽  
Diamond Coatings ◽  
Hot Filament

The adhesion of wear-resistant diamond coating deposited on titanium was weakened by the porous titanium carbide interlayer, which was formed before film growth. In order to enhance substrate-coating adherence, a new pretreatment method was presented: Ti substrates were carbonized by hot filament chemical vapor deposition system, and then the carbonized substrates were ultrasonically vibrated using diamond micro-powder suspension. Diamond coatings were deposited by hot filament chemical vapor deposition as well. The effect of carbonization time on adhesion was investigated. The carbonized substrates and the interface between diamond coatings and substrates were characterized. The results showed that as the carbonization time increases, porous structures and cracks appear and increase on the surface of the substrate. The carbonized substrates possess high surface energy and thus the nucleation is promoted. After deposition, a dense and thin titanium carbide was observed. Ultrasonic after carbonization pretreatment can significantly enhance the adhesion of Ti-based diamond coatings by promoting nucleation and suppressing the formation of porous titanium carbide.

Spatially Resolved In Situ Diagnostics for Plasma-Enhanced Chemical Vapor Deposition Carbon Film Growth

2012 ◽  
Vol 7 (1) ◽  
pp. 90-94 ◽  
Author(s):  
Rinat R. Ismagilov ◽  
Aleksey A. Zolotukhin ◽  
Petr V. Shvets ◽  
Alexander N. Obraztsov
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Spatially Resolved

Cubic Silicon Carbite Film Growth and Characterization by Hot Filament Chemical Vapor Deposition

1994 ◽  
Vol 11 (11) ◽  
pp. 709-712 ◽  
Author(s):  
Hongtao Shi ◽  
Rong Zhang ◽  
Youdou Zheng ◽  
Yuliang He ◽  
Xiangna Liu
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hot Filament
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