Characterization of Atomically Smooth Al Films by Transmission Electron Microscopy and Atomic Force Microscopy

1997 ◽  
Vol 26 (8) ◽  
pp. 709-710 ◽  
Author(s):  
Morihide Higo ◽  
X. Lu ◽  
U. Mazur ◽  
K. W. Hipps
2007 ◽  
Vol 17 (16) ◽  
pp. 3332-3338 ◽  
Author(s):  
S. Piperno ◽  
I. Kaplan-Ashiri ◽  
S. R. Cohen ◽  
R. Popovitz-Biro ◽  
H. D. Wagner ◽  
...  

1995 ◽  
Vol 378 ◽  
Author(s):  
G. Kissinger ◽  
T. Morgenstern ◽  
G. Morgenstern ◽  
H. B. Erzgräber ◽  
H. Richter

AbstractStepwise equilibrated graded GexSii-x (x≤0.2) buffers with threading dislocation densities between 102 and 103 cm−2 on the whole area of 4 inch silicon wafers were grown and studied by transmission electron microscopy, defect etching, atomic force microscopy and photoluminescence spectroscopy.


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