706 High Accuracy Analysis Method by Only two Pictures for Electric Speckle Pattern Interferometry

2013 ◽  
Vol 2013.88 (0) ◽  
pp. _7-6_
Author(s):  
Takuya INOUE ◽  
Yasuhiko ARAI
2012 ◽  
Vol 2012 (0) ◽  
pp. _821-1_-_821-9_
Author(s):  
Toyomi YOSHIDA ◽  
Kazuyuki YAMAGUCHI ◽  
Yohei MAGARA ◽  
Akira ENDO

2005 ◽  
Vol 2005.15 (0) ◽  
pp. 441-444
Author(s):  
Yoshiharu Iwata ◽  
Shintaro Hayashi ◽  
Ryohei Satoh ◽  
Kozo Fujimoto

Author(s):  
Zhenzhong Chen ◽  
Zihao Wu ◽  
Xiaoke Li ◽  
Ge Chen ◽  
Guangfeng Chen ◽  
...  

The first-order reliability method is widely used for structural reliability analysis; however, its accuracy would become worse for nonlinear problems. This paper proposes the accuracy analysis method of the first-order reliability method, which considers the worst cases when using the first-order reliability method and gives the possible value range of the probability of safety. The accuracy analysis method can evaluate the reliability level of the first-order reliability method when the failure surfaces are nonlinear. The calculation formula for the possible value range of the probability of safety is proposed, and its trend as the dimensions and reliability rise is also discussed in this paper. A numerical example and a honeycomb crashworthiness design are presented to validate the accuracy of the first-order reliability method, and the results show that they are located within the possible value range proposed in this paper.


2019 ◽  
Vol 15 (11) ◽  
pp. 3090
Author(s):  
Wu Sai ◽  
Wang Zhihui ◽  
Meng Sachura ◽  
Zheng Weijun ◽  
Shao Weiping

1993 ◽  
Vol 37 ◽  
pp. 229-234 ◽  
Author(s):  
H. Kohno ◽  
T. Arai ◽  
Y. Araki ◽  
R. Wilson

The wafer analyzer has been used to fulfil many applications needs in the semiconductor industry. The prominent features of the XRF method for the semiconductor industry are:analysis of many types of films, e.g., oxides, silicides and metallic alloys, and simultaneous analysis of film thickness and compositions.In the past, the analysis results of BPSG (Boron-doped Phospho-Silicate Glass) films, with thicknesses greater than 4000 Å, were reported. With the recent increased demand for larger scale and higher quality semiconductor devices (larger than 64 Mbit), more accurate analysis with high precision has been required.


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