Basic study of abrasive behavior in the new lapping technology using electric field

2016 ◽  
Vol 2016.11 (0) ◽  
pp. C30
Author(s):  
Takayuki KUSUMI ◽  
Hiroshi IKEDA ◽  
Ryuta NAKAMURA ◽  
Yoichi AKAGAMI
Keyword(s):  
Electric Field ◽  
Basic Study ◽  
Abrasive Behavior

scholarly journals A Basic Study on Propagation Mechanism of a Lasernduced Long Gap Leader Based on the Measurement of Electric Field

1998 ◽  
Vol 118 (11) ◽  
pp. 1291-1297
Author(s):  
Toshinori Tsuji ◽  
Masahisa Otsubo ◽  
Chikahisa Honda ◽  
Michihiro Uchiumi ◽  
Katsunori Muraoka ◽  
...  
Keyword(s):  
Electric Field ◽  
Propagation Mechanism ◽  
Basic Study ◽  
Long Gap

C13 Basic study on highly efficient polishing technique for single sapphire wafer under AC electric field.

2012 ◽  
Vol 2012.9 (0) ◽  
pp. 151-152
Author(s):  
Shogo CHIBA ◽  
Masuhiro TSUCHIDA ◽  
Yasuharu KEMURIYAMA ◽  
Tatsuo TAKAHASHI ◽  
Ryuta NAKAMURA ◽  
...  
Keyword(s):  
Electric Field ◽  
Basic Study ◽  
Sapphire Wafer ◽  
Highly Efficient ◽  
Ac Electric Field

scholarly journals C16 Basic study of improvement mechanism for polishing rate using controlled slurry under AC electric field

2012 ◽  
Vol 2012.9 (0) ◽  
pp. 155-156
Author(s):  
Takayuki KUSUMI ◽  
Ryuta NAKAMURA ◽  
Yasuhiro SATO ◽  
Yoichi AKAGAMI ◽  
Noritsugu UMEHARA
Keyword(s):  
Electric Field ◽  
Basic Study ◽  
Ac Electric Field

scholarly journals The Development of AC Electric Field Assisted Polishing for Silicon Carbide Substrates with Control of Abrasive Behavior

2013 ◽  
Vol 79 (1) ◽  
pp. 87-92 ◽  
Author(s):  
Takayuki KUSUMI ◽  
Yasuhiro SATO ◽  
Hiroshi IKEDA ◽  
Yoichi AKAGAMI ◽  
Noritsugu UMEHARA
Keyword(s):  
Silicon Carbide ◽  
Electric Field ◽  
Ac Electric Field ◽  
Abrasive Behavior

scholarly journals A Basic Study on Electric Field Behavior of Gas-Insulated Transmission Line (GIL) Having Bundle-Conductor

1997 ◽  
Vol 117 (7) ◽  
pp. 1069-1070
Author(s):  
Shinji Yasuda ◽  
Yasuo Nishikori ◽  
Minoru Murano ◽  
Teruya Kouno
Keyword(s):  
Electric Field ◽  
Transmission Line ◽  
Basic Study ◽  
Field Behavior

Resolution in photoelectron microscopy

1991 ◽  
Vol 49 ◽  
pp. 458-459
Author(s):  
G. F. Rempfer
Keyword(s):  
Electron Microscopy ◽  
Electric Field ◽  
Ultraviolet Light ◽  
Uniform Field ◽  
Virtual Image ◽  
Lens System ◽  
Photoemission Electron Microscopy ◽  
Planar Electrode ◽  
Electron Lens ◽  
Photoemission Electron

In photoelectron microscopy (PEM), also called photoemission electron microscopy (PEEM), the image is formed by electrons which have been liberated from the specimen by ultraviolet light. The electrons are accelerated by an electric field before being imaged by an electron lens system. The specimen is supported on a planar electrode (or the electrode itself may be the specimen), and the accelerating field is applied between the specimen, which serves as the cathode, and an anode. The accelerating field is essentially uniform except for microfields near the surface of the specimen and a diverging field near the anode aperture. The uniform field forms a virtual image of the specimen (virtual specimen) at unit lateral magnification, approximately twice as far from the anode as is the specimen. The diverging field at the anode aperture in turn forms a virtual image of the virtual specimen at magnification 2/3, at a distance from the anode of 4/3 the specimen distance. This demagnified virtual image is the object for the objective stage of the lens system.

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