Far Infrared and Microwave Plasma Diagnostics

1998 ◽  
Vol 33 (2T) ◽  
pp. 313-320
Author(s):  
G. Waidmann
Keyword(s):  
Plasma Diagnostics ◽  
Microwave Plasma ◽  
Far Infrared

High resolution far infrared polarimeter for plasma diagnostics

1992 ◽  
Vol 13 (5) ◽  
pp. 591-608 ◽  
Author(s):  
S. L. Prunty ◽  
M. C. Sexton ◽  
E. Zilli
Keyword(s):  
High Resolution ◽  
Plasma Diagnostics ◽  
Far Infrared

Development of short-wavelength far-infrared laser for high density plasma diagnostics

2001 ◽  
Vol 72 (1) ◽  
pp. 1094-1097 ◽  
Author(s):  
S. Okajima ◽  
K. Nakayama ◽  
H. Tazawa ◽  
K. Kawahata ◽  
K. Tanaka ◽  
...  
Keyword(s):  
Plasma Diagnostics ◽  
Short Wavelength ◽  
Far Infrared ◽  
Infrared Laser ◽  
High Density ◽  
Far Infrared Laser ◽  
Density Plasma

Extension of Measurable Density Ranges in Microwave Plasma Diagnostics

1966 ◽  
Vol 5 (11) ◽  
pp. 1100-1106 ◽  
Author(s):  
Susumu Takeda ◽  
Motoshi Masumi
Keyword(s):  
Plasma Diagnostics ◽  
Microwave Plasma

Far infrared spectra of amorphous-Si:H thin films on polyethylene

1983 ◽  
Vol 61 (2) ◽  
pp. 305-308
Author(s):  
M. S. Mathur ◽  
H. C. Card ◽  
K. C. Kao ◽  
S. R. Mejia ◽  
G. C. Tabisz
Keyword(s):  
Thin Films ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Far Infrared ◽  
Substrate Material ◽  
Absorption Bands ◽  
Silicon Thin Films ◽  
Infrared Measurements ◽  
Hydrogenated Amorphous

Hydrogenated amorphous-silicon thin films (a-Si:H) were deposited by microwave plasma chemical-vapour decomposition of SiH4, on thin polyethylene sheets. The high-resolution, far infrared measurements were performed on these films in the 700–50 cm−1 region on a Nicolet far infrared interferometer. The use of polyethylene as the substrate material permitted the determination of the absorption bands at 656.4, 652, 639.4, and 543 cm−1 with a shoulder at 539 cm−1 and a broad feature at 70.8 cm−1. These features provided evidence for SiH, SiH2 (as predicted by Lucovsky et al.), and SiH3 combinations in the film, as well as far more complex systems.

Far-Infrared Spectroscopic Study of Diamond Films

1989 ◽  
Vol 162 ◽  
Author(s):  
A. J. Gatesman ◽  
R. H. Giles ◽  
G. C. Phillips ◽  
J. Waldman ◽  
L. P. Bourget ◽  
...  
Keyword(s):  
Refractive Index ◽  
Spectroscopic Study ◽  
Microwave Plasma ◽  
Complex Refractive Index ◽  
Diamond Films ◽  
Far Infrared ◽  
Infrared Spectroscopic Study ◽  
Infrared Spectroscopic ◽  
Frequency Regime ◽  
Reflectivity Data

High quality polycrystalline diamond films grown on Si substrates by microwave plasma enhanced chemical vapor deposition were characterized in a far-infrared spectroscopic study. The spectroscopic transmissivity data were used to derive a model for the complex refractive index (n – ik) as a function of wavelength in the 10 to 200 cm−1 frequency regime. Similar transmissivity and reflectivity data from samples of varying thickness were used to validate this model. The continuum of measured transmissivity and reflectivity data from 10 to 200 cm−1 were shown to be in excellent agreement with the values calculated from the refractive index model. The films were shown to have low loss in this frequency regime.

Recent developments in optically pumped far‐infrared lasers for plasma diagnostics (abstract)

1990 ◽  
Vol 61 (10) ◽  
pp. 3307-3307
Author(s):  
Y. Jiang ◽  
C. L. Rettig ◽  
S. Burns ◽  
J. H. Lee ◽  
N. C. Luhmann ◽  
...  
Keyword(s):  
Plasma Diagnostics ◽  
Far Infrared ◽  
Infrared Lasers ◽  
Optically Pumped ◽  
Far Infrared Lasers ◽  
Recent Developments

A twin optically-pumped far-infrared CH3OH laser for plasma diagnostics

1980 ◽  
Vol 1 (1) ◽  
pp. 57-76 ◽  
Author(s):  
M. Yamanaka ◽  
Y. Takeda ◽  
S. Tanigawa ◽  
A. Nishizawa ◽  
N. Noda ◽  
...  
Keyword(s):  
Plasma Diagnostics ◽  
Far Infrared ◽  
Optically Pumped
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