Optimization and continuous fabrication of moth-eye nanostructure array on flexible polyethylene terephthalate substrate towards broadband antireflection

2017 ◽  
Vol 56 (10) ◽  
pp. 2901 ◽  
Author(s):  
Chengpeng Zhang ◽  
Peiyun Yi ◽  
Linfa Peng ◽  
Jun Ni
Nanomaterials ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 3313
Author(s):  
Jun Lan ◽  
Yong Yang ◽  
Song Hu

The application of moth-eye nanostructured polymer film on the flexible polyethylene terephthalate (PET) substrate is an effective way to improve its antireflection (AR) performance. However, many factors affect the AR properties of the moth-eye structure in the actual manufacturing process. Moreover, the antireflection research based on PET substrate has been relatively lacking compared with the silicon substrate. In this paper, we simulate and analyze the AR performance of the moth-eye nanostructured polymer film on PET substrate by using the finite-difference time-domain method within the wavelength range of 400–1100 nm. Simulation results show that the parabola-shaped moth-eye structure (PSMS) can suppress the Fresnel reflection significantly. Moreover, the height and filling ratios are the dominant factors that affect the AR performance of PSMS. Additionally, the base diameter, residual layer thickness, and the refractive index of PSMS polymer film also affect the reflectivity of PET slightly. As a result, an optimal PSMS with base diameter of 400 nm, height of 300 nm, and the hexagonal close-packed arrangement is appropriate, and the solar-weighted reflectivity of PET can be suppressed to 0.21%, which shows a prominent advantage over the bare PET (≈6%). Therefore, this research has promising potential for improving the optical performance of optoelectronic devices by using nanostructured polymer materials.


Author(s):  
Yuliia STETSIV ◽  
◽  
Іrynа ZHURAVETS’KA ◽  
Мykhaylo YATSYSHYN ◽  
Аnatoliy ZELINSKIY ◽  
...  

2007 ◽  
Vol 121-123 ◽  
pp. 657-660
Author(s):  
Heon Lee ◽  
Ki Yeon Yang ◽  
Sung Hoon Hong

In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as 100nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.


2010 ◽  
Vol 20 (5) ◽  
pp. 907-915 ◽  
Author(s):  
Lingyan Wang ◽  
Jin Luo ◽  
Jun Yin ◽  
Hao Zhang ◽  
Jinhui Wu ◽  
...  

2011 ◽  
Vol 11 (2) ◽  
pp. 1617-1620 ◽  
Author(s):  
D. W. Kim ◽  
J.-H. Kang ◽  
Y. S. Lim ◽  
M.-H. Lee ◽  
W.-S. Seo ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document