scholarly journals Si-CMOS-compatible lift-off fabrication of low-loss planar chalcogenide waveguides

2007 ◽  
Vol 15 (19) ◽  
pp. 11798 ◽  
Author(s):  
Juejun Hu ◽  
Vladimir Tarasov ◽  
Nathan Carlie ◽  
Ning-Ning Feng ◽  
Laeticia Petit ◽  
...  
Keyword(s):  
Low Loss ◽  
1994 ◽  
Vol 33 (Part 1, No. 5B) ◽  
pp. 2984-2988 ◽  
Author(s):  
Naoyuki Mishima ◽  
Yasushi Kuroda ◽  
Reiko Kobayashi ◽  
Toshiyuki Takagi

2016 ◽  
Vol 8 (5) ◽  
pp. 1-11 ◽  
Author(s):  
Luis Hoffman ◽  
Ananth Subramanian ◽  
Philippe Helin ◽  
Bert Du Bois ◽  
Roel Baets ◽  
...  

Author(s):  
Ying Huang ◽  
Xiaoguang Tu ◽  
Andy Eu-Jin Lim ◽  
Junfeng Song ◽  
Tsung-Yang Liow ◽  
...  
Keyword(s):  
Low Loss ◽  

2020 ◽  
Vol 45 (7) ◽  
pp. 2095
Author(s):  
Yuriko Maegami ◽  
Makoto Okano ◽  
Guangwei Cong ◽  
Keijiro Suzuki ◽  
Morifumi Ohno ◽  
...  

2018 ◽  
Vol 2 (4) ◽  
pp. 81
Author(s):  
Kok Yeow You ◽  
Man Seng Sim

This paper focuses on the non-destructive dielectric measurement for low-loss planar materials with a thickness of less than 3 mm using a large coaxial probe with an outer diameter of 48 mm. The aperture probe calibration procedure required only to make a measurement of the half-space air and three offset shorts. The reflection coefficient for the thin material is measured using a Keysight E5071C network analyzer from 0.3 MHz to 650 MHz and then converted to a relative dielectric constant, εr and tangent loss, tan δ via closed form capacitance model and lift-off calibration process. Average measurement error of dielectric constant, Δεr is less than 6% from 1 MHz to 400 MHz and the resolution of loss tangent, tan δ measurement is capable of achieving 10−3.


2017 ◽  
Vol 42 (21) ◽  
pp. 4391 ◽  
Author(s):  
Yanbing Zhang ◽  
Christian Reimer ◽  
Jenny Wu ◽  
Piotr Roztocki ◽  
Benjamin Wetzel ◽  
...  

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