Use of a Calculation Method for X-Ray Emission Analysis

1969 ◽  
Vol 23 (4) ◽  
pp. 346-348 ◽  
Author(s):  
A. Batt

The use of a fundamental parameter method for effecting matrix corrections in quantitative x-ray spectrochemical analysis is described. A versatile computer program calculates composition directly from measured intensities. Variations in the basic approach are employed in the analysis of a series of sulfide and oxide samples. The Applied Research Laboratories multi-channel x-ray quantometer (MXQ) is briefly described.

1982 ◽  
Vol 36 (1) ◽  
pp. 19-22 ◽  
Author(s):  
J. A. Keenan ◽  
D. Holmes

The computer program NRLXRF has been applied to the determination of minor and trace constituents in aluminum alloys and several National Bureau of Standards certified standard reference materials. Limitations arising from energy dispersive x-ray analysis and the fundamental-parameter method used by NRLXRF are illustrated.


1985 ◽  
Vol 29 ◽  
pp. 413-422 ◽  
Author(s):  
Tomoya Arai ◽  
Takashi Shoji ◽  
Kazuhiko Omote

The fundamental parameter method for quantitative analysis of composite elements has been a powerful technique for x-ray spectrochemical analysis in which the x-ray intensity and spectral distribution from x-ray spectrographic tubes are the moste ssential factors in the calculating process based on x- ray physics.


2005 ◽  
Vol 20 (2) ◽  
pp. 183-183
Author(s):  
Y. Kataoka ◽  
N. Kawahara ◽  
S. Hara ◽  
Y. Yamada ◽  
T. Matsuo ◽  
...  

1989 ◽  
Vol 33 ◽  
pp. 225-235
Author(s):  
Y. Kataoka ◽  
T. Arai

The fundamental parameter method for x-ray spectrometry has been used most commonly for bulk samples, because it permits an analysis utilizing a minimum number of standards, even for samples with complicated matrices. The need for the analysis of thin film materials, which includes multi-layer films, has been increasing in recent years along with the rapid progress of high technologies. However, there have been few reports that deal with the application of fundamental parameter methods to multi-layer thin films. There may be two situations in the analysis of thin films. In routine analysis of quality control applications, they usually require precise analysis. Fortunately, it is possible to prepare well characterized standards similar to the unknowns.


1985 ◽  
Vol 29 ◽  
pp. 395-402 ◽  
Author(s):  
T. C. Huang ◽  
W. Parrish

AbstractThe characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.


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