A MF-AC Plasma Enhanced CVD Technology for High Rate Deposition of DLC

2014 ◽  
Author(s):  
H. Tamagaki ◽  
J. Haga ◽  
H. Ito ◽  
A. Umeda
Keyword(s):  
High Rate ◽  
Plasma Enhanced Cvd

High rate deposition of nanocrystalline silicon by thermal plasma enhanced CVD

RSC Advances ◽  
2013 ◽  
Vol 3 (43) ◽  
pp. 20157 ◽  
Author(s):  
Tengfei Cao ◽  
Haibao Zhang ◽  
Binhang Yan ◽  
Yi Cheng
Keyword(s):  
Thermal Plasma ◽  
Nanocrystalline Silicon ◽  
High Rate ◽  
Plasma Enhanced Cvd

High rate deposition of SiO2 on large-scale glass by dc arc plasma enhanced CVD

1994 ◽  
Vol 178 ◽  
pp. 215-219 ◽  
Author(s):  
E. Ogino ◽  
M. Matsumoto ◽  
H. Nakai ◽  
T. Tsuno
Keyword(s):  
Large Scale ◽  
High Rate ◽  
Arc Plasma ◽  
Plasma Enhanced Cvd ◽  
Dc Arc

High rate deposition of hard a-C:H films using microwave excited plasma enhanced CVD

2011 ◽  
Vol 205 ◽  
pp. S94-S98 ◽  
Author(s):  
M. Günther ◽  
I. Bialuch ◽  
S. Peter ◽  
K. Bewilogua ◽  
F. Richter
Keyword(s):  
High Rate ◽  
Plasma Enhanced Cvd

Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates

1970 ◽  
Vol 28 ◽  
pp. 456-457
Author(s):  
L. E. Murr ◽  
G. Wong
Keyword(s):  
Single Crystal ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
High Rate ◽  
Flash Evaporation ◽  
Optimum Load ◽  
Single Crystal Films ◽  
Crystal Films ◽  
A Current

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.

Rapid Freezing of Freeze-Etch Specimens

1980 ◽  
Vol 38 ◽  
pp. 752-755
Author(s):  
A. Elgsaeter ◽  
T. Espevik ◽  
G. Kopstad
Keyword(s):  
Low Temperature ◽  
Metal Surface ◽  
Relative Velocity ◽  
Thermal Contact ◽  
High Rate ◽  
Rapid Freezing ◽  
Temperature Decrease ◽  
Freeze Etching

The importance of a high rate of temperature decrease (“rapid freezing”) when freezing specimens for freeze-etching has long been recognized1. The two basic methods for achieving rapid freezing are: 1) dropping the specimen onto a metal surface at low temperature, 2) bringing the specimen instantaneously into thermal contact with a liquid at low temperature and subsequently maintaining a high relative velocity between the liquid and the specimen. Over the last couple of years the first method has received strong renewed interest, particularily as the result of a series of important studies by Heuser and coworkers 2,3. In this paper we will compare these two freezing methods theoretically and experimentally.

Why the high rate of dropout from individualized cognitive-behavior therapy for bulimia nervosa?

2001 ◽  
Author(s):  
Z. Steel ◽  
J. Jones ◽  
S Adcock ◽  
R Clancy ◽  
L. Bridgford-West ◽  
...  
Keyword(s):  
Bulimia Nervosa ◽  
Behavior Therapy ◽  
Cognitive Behavior Therapy ◽  
High Rate ◽  
Cognitive Behavior
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