All-Thin-Film Multi-Color Electrochromic Devices

2018 ◽  
Author(s):  
F. Blanchard ◽  
Keyword(s):  
Thin Film ◽  
Electrochromic Devices

Infrared emittance modulation of all-thin-film electrochromic devices

2004 ◽  
Vol 58 (20) ◽  
pp. 2517-2520 ◽  
Author(s):  
Anna-Lena Larsson ◽  
Gunnar A Niklasson
Keyword(s):  
Thin Film ◽  
Electrochromic Devices

Electrochromic devices and thin film transistors from a new family of ethylenedioxythiophene based conjugated polymers

2011 ◽  
Vol 35 (6) ◽  
pp. 1327 ◽  
Author(s):  
Zhongtao Li ◽  
Yuan Zhang ◽  
Amanda L. Holt ◽  
Borys P. Kolasa ◽  
Justin G. Wehner ◽  
...  
Keyword(s):  
Thin Film ◽  
Conjugated Polymers ◽  
Thin Film Transistors ◽  
Electrochromic Devices ◽  
New Family

scholarly journals Infrared electrochromic conducting polymer devices

2017 ◽  
Vol 5 (23) ◽  
pp. 5824-5830 ◽  
Author(s):  
Robert Brooke ◽  
Evangelia Mitraka ◽  
Samim Sardar ◽  
Mats Sandberg ◽  
Anurak Sawatdee ◽  
...  
Keyword(s):  
Thin Film ◽  
Conducting Polymer ◽  
Effective Temperature ◽  
Electrode Material ◽  
Spectroscopic Properties ◽  
Electrochromic Devices ◽  
Thermal Camera ◽  
Metal Free ◽  
Infrared Signature ◽  
Polymer Devices

Metal-free, flexible infrared electrochromic devices were fabricated using PEDOT:Tos as both the electrochromic and the electrode material, enabling modulation of the devices' infrared signature and their effective temperature as seen by a thermal camera. In addition to evaluating the practical suitability of these devices, we report a detailed investigation of the thin film spectroscopic properties.

Physical Structure and the Electrochromic effect in Tungsten Oxide Films

1983 ◽  
Vol 24 ◽  
Author(s):  
A. P. Giri ◽  
R. Messier
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Tungsten Oxide ◽  
Physical Structure ◽  
Structure Property ◽  
Electrochromic Devices ◽  
Tungsten Oxide Thin Films ◽  
Electrochromic Effect ◽  
Evolutionary Growth

ABSTRACTIn all previous studies of tungsten oxide films it has been implicitly assumed that the film is uniform except for grain boundaries in polycrystalline films. In this study we show that amorphous tungsten oxide thin films contain highly anisotropic void networks which not only dominate their physical structure but also control their electrochromic behaviour. The void network structure is controlled primarily through ion bombardment of the growing film during deposition while the film stoichiometry HyWO3−x is controlled by the reactive sputtering processes of tungsten in Ar/O2/H2 atmospheres. The evolutionary growth model of physical structure was studied in detail by both transmission and scanning electron microscopy. On the basis of physical structure-property correlations we are able to consistently explain the basic electrochromic characteristics and chemical stability of the films. Such information leads to better understanding of the problems and limitations inherent in thin film electrochromic devices.

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