Charakterisierung von aufgestäubten Chromnitridschichten / Characterization of Sputter Deposited Chromium Nitride Coatings

Practical Metallography ◽

10.1515/pm-1989-260204 ◽

1989 ◽

Vol 26 (2) ◽

pp. 68-82

Author(s):

Dietmar Dubiel

Keyword(s):

Chromium Nitride ◽

Nitride Coatings ◽

Sputter Deposited

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Characterization of aluminum–aluminum nitride coatings sputter deposited using the pulsed gas process

Journal of Vacuum Science and Technology ◽

10.1116/1.571334 ◽

1982 ◽

Vol 20 (3) ◽

pp. 462-465 ◽

Author(s):

R. W. Springer ◽

C. D. Hosford

Keyword(s):

Aluminum Nitride ◽

Nitride Coatings ◽

Sputter Deposited

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Characterization of aluminum-aluminum nitride coatings sputter deposited using the pulsed gas process

Vacuum ◽

10.1016/0042-207x(83)90704-2 ◽

1983 ◽

Vol 33 (7) ◽

pp. 417

Keyword(s):

Aluminum Nitride ◽

Nitride Coatings ◽

Sputter Deposited

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Characterization of sputter-deposited chromium nitride thin films for hard coatings

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00443-x ◽

1997 ◽

Vol 94-95 ◽

pp. 398-402 ◽

Author(s):

P. Hones ◽

R. Sanjines ◽

F. Levy

Keyword(s):

Hard Coatings ◽

Chromium Nitride ◽

Sputter Deposited

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Characterization of hard chromium nitride coatings deposited by cathodic arc vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)03071-x ◽

1996 ◽

Vol 86-87 ◽

pp. 788-796 ◽

Author(s):

W.K. Grant ◽

C. Loomis ◽

J.J. Moore ◽

D.L. Olson ◽

B. Mishra ◽

...

Keyword(s):

Vapor Deposition ◽

Chromium Nitride ◽

Hard Chromium ◽

Nitride Coatings ◽

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Crystallographic characterization of sputter-deposited epitaxial Nb-Cu-Co and Nb-Cu-Permalloy multilayers using electron back-scatter diffraction patterns

Philosophical Magazine A ◽

10.1080/014186101300012174 ◽

2001 ◽

Vol 81 (2) ◽

pp. 261-273 ◽

Author(s):

R. Loloee, W. P. Pratt Jr, M. A. Crimp

Keyword(s):

Electron Back Scatter Diffraction ◽

Diffraction Patterns ◽

Sputter Deposited

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Optical Characterization of Sputter Deposited CdS Thin Films and Measurement of Deposition Rate

2020 IEEE Region 10 Symposium (TENSYMP) ◽

10.1109/tensymp50017.2020.9230706 ◽

2020 ◽

Author(s):

E.M.K. Ikball Ahamed ◽

N.K. Das ◽

S.F.U. Farhad ◽

M.N.I. Khan ◽

M.A. Matin ◽

...

Keyword(s):

Deposition Rate ◽

Optical Characterization ◽

Cds Thin Films ◽

Sputter Deposited

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3958. Structural and compositional characterization of sputter deposited WC + Co films. (USA)

Vacuum ◽

10.1016/s0042-207x(79)80846-5 ◽

1979 ◽

Vol 29 (4-5) ◽

pp. 197

Keyword(s):

Sputter Deposited ◽

Compositional Characterization

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Growth and characterization of radio frequency magnetron sputter-deposited zinc stannate, Zn2SnO4, thin films

Journal of Applied Physics ◽

10.1063/1.1483104 ◽

2002 ◽

Vol 92 (1) ◽

pp. 310-319 ◽

Author(s):

David L. Young ◽

Helio Moutinho ◽

Yanfa Yan ◽

Timothy J. Coutts

Keyword(s):

Radio Frequency ◽

Radio Frequency Magnetron ◽

Zinc Stannate ◽

Magnetron Sputter ◽

Sputter Deposited

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Chromium nitride coatings grown by unbalanced magnetron (UBM) and combined arc/unbalanced magnetron (ABS™) deposition techniques

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)02949-0 ◽

1996 ◽

Vol 86-87 ◽

pp. 192-199 ◽

Author(s):

T. Hurkmans ◽

D.B. Lewis ◽

J.S. Brooks ◽

W.-D. Münz

Keyword(s):

Chromium Nitride ◽

Unbalanced Magnetron ◽

Nitride Coatings ◽

Deposition Techniques

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Characterization of Titanium Nitride Coatings Deposited by Metal Plasma Ion Pre-Implantation and Cathodic Arc Evaporation

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2009.c102 ◽

2009 ◽

Vol 9 (2) ◽

pp. 1127-1132 ◽

Author(s):

Ko-Wei Weng ◽

Ya-Chi Chen ◽

Tai-Nan Lin ◽

Da-Yun Wang

Keyword(s):

Titanium Nitride ◽

Metal Plasma ◽

Nitride Coatings ◽

Cathodic Arc Evaporation ◽

Arc Evaporation ◽

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