Role of Surface on the Persistent Photoconductivity in Porous Silicon and Boron Doped a-Si:H

2006 ◽  
Vol 910 ◽  
Author(s):  
S. C. Agarwal ◽  
Abhishek Kumar ◽  
N P Mandal

AbstractThe effect of ambient conditions on light soaking (LS) in porous silicon (PS) sample is studied. In vacuum LS on porous silicon increases dark current (DC) while in presence of water vapor it decreases DC. Interestingly, LS gives a higher DC in vacuum as well as in presence of water vapor for boron doped hydrogenated amorphous silicon a-Si:H(B) samples. A thin layer of polystyrene polymer almost eliminates the light induced degradation of porous silicon (PS) layers but can do so only to a smaller extent in a-Si:H(B). This shows that the effect of LS in PS is different than the effect of LS in a-Si:H(B) and that the surface plays a more important role in PS than in a-Si:H.

1985 ◽  
Vol 49 ◽  
Author(s):  
Martin Stutzmann ◽  
Warren B. Jackson ◽  
Chuang Chuang Tsai

AbstractThe dependence of the creation and the annealing of metastable dangling bonds in hydrogenated amorphous silicon on various material parameters will be discussed in the context of a recently proposed model. After a brief review of the kinetic behaviour governing defect creation and annealing in undoped a- Si:H, a number of special cases will be analyzed: the influence of alloying with O, N, C, and Ge, changes introduced by doping and compensation, and the role of mechanical stress. Finally, possibilities to increase the stability of a-Si:H based devices will be examined.


1981 ◽  
Vol 52 (12) ◽  
pp. 7275-7280 ◽  
Author(s):  
Shunri Oda ◽  
Keishi Saito ◽  
Hisashi Tomita ◽  
Isamu Shimizu ◽  
Eiichi Inoue

1992 ◽  
Vol 258 ◽  
Author(s):  
Sufi Zafar ◽  
E. A. Schiff

ABSTRACTA model for correlating the observed properties of hydrogenated amorphous silicon (a-Si:H) with the underlying hydrogen microstructure is reviewed. The model provides a unified description of defect equilibration, hydrogen evolution, rehydrogenation and hydrogen diffusion measurements.


RSC Advances ◽  
2017 ◽  
Vol 7 (31) ◽  
pp. 19189-19196 ◽  
Author(s):  
Z. Marvi ◽  
S. Xu ◽  
G. Foroutan ◽  
K. Ostrikov ◽  
I. Levchenko

Physical and chemical mechanisms and role of plasma in the synthesis of hydrogenated amorphous silicon were studied numerically to reveal the key growth processes and, hence, to ensure a higher level of control over the film structure and properties.


1996 ◽  
Vol 68 (5) ◽  
pp. 684-686 ◽  
Author(s):  
Peter C. Sercel ◽  
Daewon Kwon ◽  
Teha Vilbrandt ◽  
Weidong Yang ◽  
John Hautala ◽  
...  

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