Triple Junction n-i-p Solar Cells with Hot-Wire Deposited Protocrystalline and Microcrystalline Silicon

2007 ◽  
Vol 989 ◽  
Author(s):  
Ruud E.I. Schropp ◽  
Hongbo Li ◽  
Ronald H.J. Franken ◽  
Jatindra K. Rath ◽  
Karine van der Werf ◽  
...  

AbstractWe have implemented a number of methods to improve the performance of proto-Si/proto-SiGe/μc-Si:H triple junction n-i-p solar cells in which the top and bottom cell i-layers are deposited by Hot-Wire CVD. Firstly, a significant current enhancement is obtained by using textured Ag/ZnO back contacts developed in house instead of plain stainless steel. We studied the correlation between the integrated current density in the long wavelength range (650-1000 nm) with the back reflector surface roughness and clarified that the rms roughness from 2D AFM images correlates well with the long wavelength response of the cell when weighted with a Power Spectral Density function. For single junction 2-μm thick μc-Si:H n-i-p cells we improved the short circuit current density from the value of 15.2 mA/cm2 for plain stainless steel to 23.4 mA/cm2 for stainless steel coated with a textured Ag/ZnO back reflector.Secondly, we optimized the μc-Si:H n-type doped layer on this rough back reflector, the n/i interface, and in addition used a profiling scheme for the H2/SiH4 ratio during i-layer deposition. The H2 dilution during growth was stepwise increased in order to prevent a transition to amorphous growth. The efficiency that was reached for a single junction μc-Si:H n-i-p cell was 8.5%, which is the highest reported value for hot-wire deposited cells of this kind, whereas the deposition rate of 2.1 Å/s is about twice as high as in record cells of this type so far. Moreover, these cells show to be totally stable under light-soaking tests.Combining the above techniques, a rather thin triple junction cell (total silicon thickness 2.5 μm) has been obtained with an efficiency of 10.9%. Preliminary light-soaking tests show that this type of triple cells degrades by less than 4%.

Crystals ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 726
Author(s):  
Ray-Hua Horng ◽  
Yu-Cheng Kao ◽  
Apoorva Sood ◽  
Po-Liang Liu ◽  
Wei-Cheng Wang ◽  
...  

In this study, a mechanical stacking technique has been used to bond together the GaInP/GaAs and poly-silicon (Si) solar wafers. A GaInP/GaAs/poly-Si triple-junction solar cell has mechanically stacked using a low-temperature bonding process which involves micro metal In balls on a metal line using a high-optical-transmission spin-coated glue material. Current–voltage measurements of the GaInP/GaAs/poly-Si triple-junction solar cells have carried out at room temperature both in the dark and under 1 sun with 100 mW/cm2 power density using a solar simulator. The GaInP/GaAs/poly-Si triple-junction solar cell has reached an efficiency of 24.5% with an open-circuit voltage of 2.68 V, a short-circuit current density of 12.39 mA/cm2, and a fill-factor of 73.8%. This study demonstrates a great potential for the low-temperature micro-metal-ball mechanical stacking technique to achieve high conversion efficiency for solar cells with three or more junctions.


2020 ◽  
Vol 8 (31) ◽  
pp. 15984-15991 ◽  
Author(s):  
Fangfang Cai ◽  
Hongjian Peng ◽  
Honggang Chen ◽  
Jun Yuan ◽  
Jiefeng Hai ◽  
...  

Acceptor Y22 with an asymmetric hexacyclic A–DA′D–A structure achieved a high PCE of 15.4% and a high Jsc of 24.37 mA cm−2, which are among the best values reported for asymmetric acceptor based binary organic solar cells.


2019 ◽  
Vol 821 ◽  
pp. 407-413 ◽  
Author(s):  
Mohamed Orabi Moustafa ◽  
Tariq Alzoubi

The performance of the InGaN single-junction thin film solar cells has been analyzed numerically employing the Solar Cell Capacitance Simulator (SCAPS-1D). The electrical properties and the photovoltaic performance of the InGaN solar cells were studied by changing the doping concentrations and the bandgap energy along with each layer, i.e. n-and p-InGaN layers. The results reveal an optimum efficiency of the InGaN solar cell of ~ 15.32 % at a band gap value of 1.32 eV. It has been observed that lowering the doping concentration NA leads to an improvement of the short circuit current density (Jsc) (34 mA/cm2 at NA of 1016 cm−3). This might be attributed to the increase of the carrier mobility and hence an enhancement in the minority carrier diffusion length leading to a better collection efficiency. Additionally, the results show that increasing the front layer thickness of the InGaN leads to an increase in the Jsc and to the conversion efficiency (η). This has been referred to the increase in the photogenerated current, as well as to the less surface recombination rate.


2020 ◽  
Vol 11 ◽  
pp. 2
Author(s):  
Derese Desta ◽  
Rita Rizzoli ◽  
Caterina Summonte ◽  
Rui N. Pereira ◽  
Arne Nylandsted Larsen ◽  
...  

The article presents a nanoparticle-based buried light-scattering (BLiS) back-reflector design realized through a simplified nanofabrication technique for the purpose of light-management in solar cells. The BLiS structure consists of a flat silver back-reflector with an overlying light-scattering bilayer which is made of a TiO2 dielectric nanoparticles layer with micron-sized inverted pyramidal cavities, buried under a flat-topped silicon nanoparticles layer. The optical properties of this BLiS back-reflector show high broadband and wide angular distribution of diffuse light-scattering. The efficient light-scattering by the buried inverted pyramid back-reflector is shown to effectively improve the short-circuit-current density and efficiency of the overlying n-i-p amorphous silicon solar cells up to 14% and 17.5%, respectively, compared to the reference flat solar cells. A layer of TiO2 nanoparticles with exposed inverted pyramid microstructures shows equivalent light scattering but poor fill factors in the solar cells, indicating that the overlying smooth growth interface in the BLiS back-reflector helps to maintain a good fill factor. The study demonstrates the advantage of spatial separation of the light-trapping and the semiconductor growth layers in the photovoltaic back-reflector without sacrificing the optical benefit.


2009 ◽  
Vol 1153 ◽  
Author(s):  
Jeffrey Yang ◽  
Baojie Yan ◽  
Guozhen Yue ◽  
Subhendu Guha

AbstractLight trapping effect in hydrogenated amorphous silicon-germanium alloy (a-SiGe:H) and nano-crystalline silicon (nc-Si:H) thin film solar cells deposited on stainless steel substrates with various back reflectors is reviewed. Structural and optical properties of the Ag/ZnO back reflectors are systematically characterized and correlated to solar cell performance, especially the enhancement in photocurrent. The light trapping method used in our current production lines employing an a-Si:H/a-SiGe:H/a-SiGe:H triple-junction structure consists of a bi-layer of Al/ZnO back reflector with relatively thin Al and ZnO layers. Such Al/ZnO back reflectors enhance the short-circuit current density, Jsc, by ˜20% compared to bare stainless steel. In the laboratory, we use Ag/ZnO back reflector for higher Jsc and efficiency. The gain in Jsc is about ˜30% for an a-SiGe:H single-junction cell used in the bottom cell of a multi-junction structure. In recent years, we have also worked on the optimization of Ag/ZnO back reflectors for nano-crystalline silicon (nc-Si:H) solar cells. We have carried out a systematic study on the effect of texture for Ag and ZnO. We found that for a thin ZnO layer, a textured Ag layer is necessary to increase Jsc, even though the parasitic loss is higher at the Ag and ZnO interface due to the textured Ag. However, a flat Ag can be used for a thick ZnO to reduce the parasitic loss, while the light scattering is provided by the textured ZnO. The gain in Jsc for nc-Si:H solar cells on Ag/ZnO back reflectors is in the range of ˜60-75% compared to cells deposited on bare stainless steel, which is much larger than the enhancement observed for a-SiGe:H cells. The highest total current density achieved in an a-Si:H/a-SiGe:H/nc-Si:H triple-junction structure on Ag/ZnO back reflector is 28.6 mA/cm2, while it is 26.9 mA/cm2 for a high efficiency a-Si:H/a-SiGe:H/a-SiGe:H triple-junction cell.


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