Reduction in the Effective Barrier Height in Ptsi-P-Si Schottky Diodes by Using Low Energy Ion Implantation
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A reduction in the effective barrier height in a PtSi-p-Si Schottky diode was achieved using low energy ion implantation to introduce a shallow p+ layer on a p-Si substrate. After the Schottky diode had been implanted with 3 keV 11B+ ions to a dose of 4 × 1012 ions cm−2, the barrier height was observed to decrease from 0.26 to 0.16eV. The reduction in barrier height correlated well with the boronconcentration found at or near the PtSi-Si interface.
1979 ◽
Vol 26
(11)
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pp. 1838-1838
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1980 ◽
Vol 27
(7)
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pp. 1310-1312
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2003 ◽
Vol 36
(19)
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pp. 2347-2351
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2005 ◽
Vol 49
(4)
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pp. 606-611
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