Synthesis of High Quality Few Layer Graphene Sheets in Large Quantities by Radio Frequency Chemical Vapor Deposition

AbstractThis work reports a low-cost method for large scale production of high quality graphene via radio-frequency chemical vapor deposition. High quantities of graphene were successfully synthesized on the Fe-Co/MgO (2.5:2.5:95 wt.%) catalytic system utilizing acetylene as a hydrocarbon source at 1000 °C. The as-produced graphene sheets were purified in a single step by washing with a diluted hydrochloric acid solution under sonication. Next, they were thoroughly characterized by microscopy, spectroscopy, and X-Ray diffraction. Advanced transmission electron microscopy and atomic force microscopy analyses have indicated the formation of 3-5 layered graphene nanosheets. Thorough analyses by Raman spectroscopy were also performed demonstrating the presence of high quality and few-layer graphene samples. This low cost and highly reproducible method may be applied in a straightforward way to produce large quantities of graphene for various advanced applications.

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Synthesis of Ag-decorated, few-layer graphene structures over a novel Ag/MgO catalytic system by radio-frequency chemical vapor deposition

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2012.11.030 ◽

2013 ◽

Vol 138 (2-3) ◽

pp. 454-461 ◽

Cited By ~ 12

Author(s):

Alexandru Radu Biris ◽

Enkeleda Dervishi ◽

Stefania Ardelean ◽

Mihaela D. Lazar ◽

Fumiya Watanabe ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Catalytic System ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer Graphene ◽

Few Layer Graphene ◽

Graphene Structures

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The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process

MRS Proceedings ◽

10.1557/proc-689-e7.8 ◽

2001 ◽

Vol 689 ◽

Author(s):

Shara S. Shoup ◽

Marvis K. White ◽

Steve L. Krebs ◽

Natalie Darnell ◽

Adam C. King ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

High Temperature ◽

Critical Current Density ◽

Buffer Layer ◽

Critical Current ◽

Vapor Deposition ◽

Low Cost ◽

Chemical Vapor ◽

High Critical Current Density ◽

High Quality

ABSTRACTThe innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. A buffer layer architecture of strontium titanate and ceria have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with high critical current density values. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm2. Work is currently in progress to combine both the buffer layer and superconductor technologies to produce high-quality coupons of HTS tape made entirely by the non-vacuum CCVD process.

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Chemical vapor deposition growth of few-layer graphene for transparent conductive films

RSC Advances ◽

10.1039/c5ra03919c ◽

2015 ◽

Vol 5 (55) ◽

pp. 44142-44148 ◽

Cited By ~ 7

Author(s):

Jun Pu ◽

Lei Tang ◽

Chaowei Li ◽

Taotao Li ◽

Lin Ling ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Conductive Films ◽

Layer Graphene ◽

Pressure Chemical ◽

Few Layer Graphene ◽

Etching Effect

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).

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