Probing the Densities of Gap States in Intrinsic a-Si:H Using Space Charge Limited Currents of Electrons and Holes

1990 ◽  
Vol 192 ◽  
Author(s):  
Robin M. Dawson ◽  
J. H. Smith ◽  
C. R. Wronski

ABSTRACTSpace charge limited currents of holes in intrinsic hydrogenated amorphous silicon (a-Si:H) have been obtained using novel p+-intrinsic-p+ (p-i-p) structures. The presence of these hole space charge limited currents is verified from their temperature dependence and their dependence on a wide range of intrinsic layer thickness. The carrier transport and space charge limited currents in the p-i-p structures are compared with those of n-i-n structures and the results are discussed in terms of a self consistent density of states in the gap.

2001 ◽  
Vol 664 ◽  
Author(s):  
Naser Sedghi ◽  
Bill Eccleston

ABSTRACTSteady-state space-charge limited current (SCLC) measurements are used to investigate the density of states (DOS) in the mobility gap of hydrogenated amorphous silicon (a-Si:H). The density of states is calculated by different methods based on both continuous DOS and discrete traps assumptions. The density of states found by the SCLC measurements is used to set the trap densities and trap energy levels to model a vertical a-Si:H thin-film transistor (TFT) using the Medici device simulation package. The effect of different sets of traps in the bulk of a-Si:H and variation of the physical dimensions of the device on the characteristics of the vertical TFT is studied. The simulation on the space-charge limited current is performed to verify the validity and accuracy of the SCLC method.


1988 ◽  
Vol 158 (2) ◽  
pp. 217-223 ◽  
Author(s):  
Teresa Ligonzo ◽  
Roberto Murri ◽  
Vincenzo Augelli ◽  
Luigi Schiavulli

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