XPS and FTIR Study of the Thin Polyimide Films Fabricated by Ionized Cluster Beam Deposition

ABSTRACTThe ionized cluster beam deposition (ICBD) technique has been employed to fabricate high-purity polyimide (PI) films. The pyromellitic dianhydride (PMDA) and oxydianiline (ODA) were deposited using dual ionized cluster beam (ICB) sources. Fourier transform infrared spectroscopy (FT-IR) and X-ray photoemission spectroscopy (XPS) studies show that the bulk and surface chemical properties are very sensitive to the ICBD conditions such as cluster ion acceleration voltage and ionization voltage. At optimum ICBD conditions, the PI films have a maximum imidization and negligible impurities(∼;1% isoimide) probably due to the high surface migration energy and surface cleaning effect.

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Electrical Properties Of Thin Polyimide Films Prepared By Ionized Cluster Beam Deposition

MRS Proceedings ◽

10.1557/proc-227-225 ◽

1991 ◽

Vol 227 ◽

Author(s):

Hyung-Jin Jung ◽

Dong-Heon Lee ◽

Jeon-Kook Lee ◽

Chung-Nam Whang

Keyword(s):

Electrical Properties ◽

Cluster Beam ◽

Thermal Curing ◽

Polyimide Films ◽

Capacitance Voltage ◽

Silicon Structures ◽

Clean Interface ◽

Cluster Beam Deposition ◽

Beam Deposition

ABSTRACTThe electrical properties of gold – polyimide - silicon structures were investigated experimentally by capacitance – voltage (C – V) measurement. Polyimide films were deposited on silicon substrate by using ionized cluster beam deposition (ICBD) of PMDA-ODA followed by in-situ thermal curing in N2 atmosphere. The resulting C – V plots show hysteresis, and it was believed to be due to the injection of carriers. The interface trap density is fairly low because of the clean interface provided by ICB technique.

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Formation, evolution, and degradation of nanostructured covalent thin films deposited by low-energy cluster beam deposition

Journal of Materials Research ◽

10.1557/jmr.2006.0216 ◽

2006 ◽

Vol 21 (7) ◽

pp. 1638-1644 ◽

Cited By ~ 5

Author(s):

Luisa D'Urso ◽

A. Alessandro Scalisi ◽

Corinna Altamore ◽

Giuseppe Compagnini

Keyword(s):

High Surface ◽

Volume Ratio ◽

Carbon Cluster ◽

Thin Layers ◽

Low Energy ◽

Laser Vaporization ◽

Cluster Beam ◽

Cluster Beam Deposition ◽

Energy Cluster ◽

Beam Deposition

Low-energy cluster beam deposition (LECBD) is considered an intriguing technique for obtaining thin layers with well-defined structures at the nano- and mesoscale levels, allowing novel optical, electronic, and magnetic properties. The produced layers are highly porous and extremely reactive due to the high surface to volume ratio and must be characterized with in situ techniques to study their original composition and their evolution once exposed to reactive gases. In this work, we present a general overview and some results on the formation, evolution, and deposition of silicon and carbon cluster beams produced using a laser vaporization source.

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Stabilization of Metastable Zinc-Blende Phase MnTe by Ionized Cluster Beam Deposition

MRS Proceedings ◽

10.1557/proc-279-855 ◽

1992 ◽

Vol 279 ◽

Author(s):

K. Ando ◽

K. Takahashi ◽

Y. Takeuchi

Keyword(s):

Ion Beam ◽

High Energy ◽

Cluster Beam ◽

Bulk Crystals ◽

Film Properties ◽

Zinc Blende ◽

Cluster Ion ◽

Cluster Beam Deposition ◽

Acceleration Voltage ◽

Beam Deposition

ABSTRACTThe ionized cluster beam (ICB) deposition was use to stabilize the metastable zinc-blende (ZB) MnTe films directly on GaAs (100) substrates at 300 °C with MnTe cluster ion beam. Influences of the ionization and the acceleration voltage on film properties were investigated by the reflection high-energy electron diffraction (RHEED), optical reflection, Raman scattering, and photoluminescence. The ZB-MnTe was stabilized by 3kV acceleration of the MnTe cluster beam. These results showed that the ICB deposition is useful to get compounds having crystalline phase different from the structures observed io equilibrium-grown bulk crystals.

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Formation, evolution and degradation of nanostructured covalent thin films deposited by Low Energy Cluster Beam Deposition

MRS Proceedings ◽

10.1557/proc-0887-q10-05 ◽

2005 ◽

Vol 887 ◽

Author(s):

Giuseppe Compagnini ◽

Luisa D'Urso ◽

A. Alessandro Scalisi ◽

Corinna Altamore ◽

Orazio Puglisi

Keyword(s):

High Surface ◽

Volume Ratio ◽

Carbon Cluster ◽

Thin Layers ◽

Low Energy ◽

Laser Vaporization ◽

Cluster Beam ◽

Cluster Beam Deposition ◽

Energy Cluster ◽

Beam Deposition

ABSTRACTLow Energy Cluster Beam Deposition (LECBD) is considered an intriguing technique to obtain thin layers with well defined structures at the nano- and meso-scale levels, allowing novel optical, electronic and magnetic properties. The produced layers are highly porous and extremely reactive due to the high surface to volume ratio and must be characterized with “in situ” techniques in order to study their original composition and their evolution once exposed to reactive gases. In this work we present a general overview and some results on the formation evolution and deposition of silicon and carbon cluster beams produced using a laser vaporization source.

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