Construction of Band Profiles for Semiconductor Heterojunctions and Layered Structures

1992 ◽  
Vol 260 ◽  
Author(s):  
J. W. Garland ◽  
L. Kassel ◽  
D. Yang ◽  
Z. Zhang ◽  
P. M. Raccah

ABSTRACTBand profiles specify the position of all band edges as a function of distance from a sample surface or interface. They largely determine the electrical and optoelectronic properties of semiconductor heterostructures. Neither theory nor standard transport measurements alone have been able to give reliable values for band offsets, much less entire band profiles. However, the use of electroreflectance, which reveals crossover transitions between localized states or band edges present on opposite sides of an interface, and which allows us to measure accurately built-in fields, has allowed us to determine accurate band profiles for several types of semiconductor heterostructures. The procedure used to find the band profile is elucidated in detail for two technologically important cases.

1990 ◽  
Vol 192 ◽  
Author(s):  
M. Yoshimi ◽  
K. Hattori ◽  
H. Okamoto ◽  
Y. Hamakawa

ABSTRACTPhotocurrent multiplication has been observed in a-Si based p−i/SiNx/i−n junction cells under reverse biased high electric field. An apparent external quantum efficiency exceeds 20. A systematic investigation on electric and optoelectronic properties has been made to clarify the mechanism of photocarrier multiplication. The results indicate the possibility of inter-band tunneling via localized states in the a-SiN layer, which is induced by field-redistribution due to the built-up of trapped charges at the a-SiN/a-Si interface.


2011 ◽  
Vol 84 (7) ◽  
Author(s):  
Yann-Michel Niquet ◽  
Christophe Delerue

2009 ◽  
Vol 95 (11) ◽  
pp. 112102 ◽  
Author(s):  
Wei Yi ◽  
Venkatesh Narayanamurti ◽  
Hong Lu ◽  
Michael A. Scarpulla ◽  
Arthur C. Gossard ◽  
...  

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