Dislocation Distributions in Cd1-xHgxTe/CdTe and Cd1-xHgxTe/Cd1-yZnyTe Grown by Liquid Phase Epitaxy

1994 ◽  
Vol 356 ◽  
Author(s):  
C. C. R. Watson ◽  
K. Durose ◽  
E. O’Keefe ◽  
J. M. Hudson ◽  
B. K. Tanner
Keyword(s):  
Liquid Phase ◽  
Dislocation Density ◽  
Liquid Phase Epitaxy ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Dislocation Densities ◽  
Threading Dislocation Density ◽  
O 24

Epilayers of LPE Cdo.24Hgo.76Te grown on (111)B CdTe and Cdi-xZnxTe substrates have been examined by defect etching and triple axis x-ray diffraction. Defect etching of bevelled layers has shown the threading dislocation density to fall with increasing distance from the heterointerface, for distances <6μm. In thicker regions however a constant ‘background’ dislocation density is observed. Background dislocation densities of ∼ 3 x 105cm-2 and 9 x 104cm-2 have been measured for layers grown on CdTe and Cdo.96Zn0.04Te respectively, this is compared with a substrate dislocation density of ∼ 3 x 104cm-2 measured in both types of substrates. The increase in the dislocation density within the epilayers compared with the corresponding substrate is discussed. An explanation is also given for the displacement of the peak dislocation density, from the interface to within the layer, observed in the Cd0.76Hg0.24Te / Cd0.96Zn0.04Te system.

Evaluation of threading dislocation density of strained Ge epitaxial layer by high resolution x-ray diffraction

2017 ◽  
Vol 26 (12) ◽  
pp. 127309 ◽  
Author(s):  
Yuan-Hao Miao ◽  
Hui-Yong Hu ◽  
Xin Li ◽  
Jian-Jun Song ◽  
Rong-Xi Xuan ◽  
...  
Keyword(s):  
High Resolution ◽  
Dislocation Density ◽  
Epitaxial Layer ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Threading Dislocation Density

X‐Ray Diffraction Microstrain Analysis for Extraction of Threading Dislocation Density of GaN Films Grown on Silicon, Sapphire, and SiC Substrates

2020 ◽  
Vol 257 (4) ◽  
pp. 1900579
Author(s):  
Victor Yon ◽  
Névine Rochat ◽  
Matthew Charles ◽  
Emmanuel Nolot ◽  
Patrice Gergaud
Keyword(s):  
Dislocation Density ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Threading Dislocation Density

Defect-Engineered Graded GexSi1-x Buffers on Si (001) with Extreme Low Threading Dislocation Density

1995 ◽  
Vol 378 ◽  
Author(s):  
G. Kissinger ◽  
T. Morgenstern ◽  
G. Morgenstern ◽  
H. B. Erzgräber ◽  
H. Richter
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Dislocation Density ◽  
Threading Dislocation ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Dislocation Densities ◽  
Threading Dislocation Density

AbstractStepwise equilibrated graded GexSii-x (x≤0.2) buffers with threading dislocation densities between 102 and 103 cm−2 on the whole area of 4 inch silicon wafers were grown and studied by transmission electron microscopy, defect etching, atomic force microscopy and photoluminescence spectroscopy.

Defect Reduction in Cd1-xZnxTe Epilayers on GaAs Substrates

1994 ◽  
Vol 299 ◽  
Author(s):  
Saket Chadda ◽  
Kevin Malloy ◽  
John Reno
Keyword(s):  
Threading Dislocation ◽  
Full Width ◽  
X Ray Diffraction ◽  
Defect Reduction ◽  
X Ray ◽  
Gaas Substrates ◽  
Transmission Electron ◽  
Threading Dislocation Density ◽  
Optimum Period ◽  
Bulk Alloys

AbstractCd0.91Zn0.09Te/CdTe multilayers of various period thicknesses were inserted into Cd0.955Zn0.045Te bulk alloys grown on (001) GaAs. The net strain of the multilayer on the underlying Cd0.955Zn0.045Te was designed to be zero. X-ray diffraction full width at half maximum (FWHM) was used as a means to optimize the period thickness of the multilayer. Transmission electron microscopy of the optimum period thickness samples demonstrated four orders of magnitude decrease in the threading dislocation density. Mechanism of bending by equi-strained multilayers is discussed.

X‐ray diffraction studies of the epitaxy ofa/b‐axes oriented YBa2Cu3O7−δfilms grown by liquid phase epitaxy

1994 ◽  
Vol 75 (10) ◽  
pp. 5243-5248 ◽  
Author(s):  
F. Sandiumenge ◽  
C. Dubs ◽  
P. Görnert ◽  
S. Galí
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
X Ray Diffraction ◽  
X Ray

Dislocation Density of Plastically Deformed Oxygen-Free Copper

2017 ◽  
Vol 905 ◽  
pp. 60-65
Author(s):  
Mutsumi Sano ◽  
Sunao Takahashi ◽  
Atsuo Watanabe ◽  
Ayumi Shiro ◽  
Takahisa Shobu
Keyword(s):  
Synchrotron Radiation ◽  
Dislocation Density ◽  
Profile Analysis ◽  
Plastic Strains ◽  
X Ray Diffraction ◽  
Diffraction Profile ◽  
X Ray ◽  
Dislocation Densities

The dislocation density of plastically deformed oxygen free copper (OFC) was evaluated by X-ray diffraction profile analysis with synchrotron radiation. The modified Williamson-Hall and modified Warren-Averbach methods were applied to the analysis. The dislocation densities of OFC samples with compressive plastic strains of 1 % and 4 % were 5.1×1014 m-2 and 9.2×1014 m-2, respectively.

scholarly journals High-resolution X-ray diffraction study of AlxGa1−xSb alloys grown by liquid-phase epitaxy

2008 ◽  
Vol 64 (a1) ◽  
pp. C592-C592
Author(s):  
M. Rojas ◽  
E. Momox ◽  
R. Delgado ◽  
V. Gayou ◽  
A. Orduna ◽  
...  
Keyword(s):  
Liquid Phase ◽  
High Resolution ◽  
Diffraction Study ◽  
Liquid Phase Epitaxy ◽  
X Ray Diffraction ◽  
X Ray
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