Fragmentation of C60 Molecules in Partially Ionized Fullerene Beam Deposition

1994 ◽  
Vol 359 ◽  
Author(s):  
Zhong-Min Ren ◽  
Xia-Xing Xiong ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Liang-Yao Chen ◽  
...  
Keyword(s):  
Raman Spectra ◽  
Amorphous Carbon ◽  
Experimental Results ◽  
Cluster Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Partially Ionized ◽  
Almost All ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTC60 films have been deposited using a partially ionized cluster beam deposition (PIBD) technique. The experimental results show that as Va. exceeds about 400 V almost all the C60 molecules fragmentate at collision with the substrate and the obtained films turn to be amorphous carbon layers at elevated Va, indicated by measurements of Raman spectra, X-ray diffraction, and ellipsometry.

Studies of C60 Films Deposited Using Ionized Cluster Beam Deposition Technique

1994 ◽  
Vol 349 ◽  
Author(s):  
Zhong-Min Ren ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Xia-Xing Xiong ◽  
Mao-Qi He ◽  
...  
Keyword(s):  
Raman Spectra ◽  
Photoelectron Spectroscopy ◽  
Carbon Films ◽  
Cluster Beam ◽  
Visible Absorption ◽  
Carbon Allotrope ◽  
X Ray ◽  
Hexagonal Close Packed Structure ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTFilms (with thicknesses about thousands A) of a new form of carbon allotrope, CIO also known as Fullerenes, are deposited on Si(111) substrates using ionized cluster beam deposition (ICBD) technique at low (65V) accelerating voltage V. X-ray &-20 diffraction (XRD) have been used to investigate the structural properties of C6Ofi lms, indicating hexagonal close-packed structure with strong (002) XRD assignment together with weak (100), (112) and(004) assignments. Raman spectra, X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are carried out to make detailed studies of the electronic properties of the films and to illustrate differences between CO films and amorphous carbon films which are deposited by ICBD at high accelerating voltage V >400V. Cio soccer-balls are found to be broken into fragments as accelerating field overtakes about 400V, indicated by the results of XPS, Raman spectra, XRD, and UV/visible absorption spectra.

Ag Films Deposited by Ionized Cluster Beam Deposition

1994 ◽  
Vol 343 ◽  
Author(s):  
Zhong-Min Ren ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Xia-Xing Xiong ◽  
Mao-Qi He ◽  
...  
Keyword(s):  
Cluster Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Surface Flatness ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTIonized cluster beam deposition (ICBD) technique has been used to deposit Ag films on both Si(111) and Si(100) substrates. Sizes of clusters in ionized cluster beam are found to distribute in a range of 100–600 atoms/cluster. X-ray diffraction (XRD), and α-step profile methods are used to analyze the properties of Ag films. As a comparison, Ag films deposited by conventional evaporation are also investigated. Highly textured Ag films with strong (111) orientation on Si (111) have been obtained at high accelerating voltage Va=4kV. The crystallinity and surface flatness of Ag films can be improved by ICBD at high accelerating voltages.

Photoluminescence and resonant Raman spectra of silicon films produced by size-selected cluster beam deposition

1997 ◽  
Vol 56 (11) ◽  
pp. 6958-6964 ◽  
Author(s):  
M. Ehbrecht ◽  
B. Kohn ◽  
F. Huisken ◽  
M. A. Laguna ◽  
V. Paillard
Keyword(s):  
Raman Spectra ◽  
Silicon Films ◽  
Cluster Beam ◽  
Resonant Raman ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Oxidation of nanostructured Ti films produced by low energy cluster beam deposition: An X-ray Photoelectron Spectroscopy characterization

2012 ◽  
Vol 520 (14) ◽  
pp. 4803-4807 ◽  
Author(s):  
Monica de Simone ◽  
Elena Snidero ◽  
Marcello Coreno ◽  
Gero Bongiorno ◽  
Luca Giorgetti ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Cluster Beam ◽  
X Ray ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Beam Deposition ◽  
Ti Films

New phases of amorphous carbon and silicon films obtained by low energy cluster beam deposition

1996 ◽  
Vol 217-218 ◽  
pp. 69-73 ◽  
Author(s):  
P. Melinon ◽  
B. Prevel ◽  
V. Dupuis ◽  
A. Perez ◽  
B. Champagnon ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Low Energy ◽  
Silicon Films ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Beam Deposition

Doping of C60 Films Using High Energy Boron Ion Implantation

1994 ◽  
Vol 359 ◽  
Author(s):  
Zhong-Min Ren ◽  
Yuan-Cheng Du ◽  
Xia-Xing Xiong ◽  
Zhi-Feng Ying ◽  
Fu-Ming Li ◽  
...  
Keyword(s):  
Fourier Transform ◽  
Ion Implantation ◽  
High Energy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Dose Ranging ◽  
Implantation Process ◽  
Almost All ◽  
C60 Films ◽  
Beam Deposition

ABSTRACTC60 films, which are deposited by partially ionized beam deposition (PIBD), are doped by 100 keV boron ion implantation at dose ranging from 3*1014 to 1*1016 cm2 The implantation process has been studied using Fourier transform infrared spectroscopy (FTIR), Raman spectra and X-ray diffraction (XRD) analyses. Almost all C60 soccer-balls in the doped region in the films are found to be broken at dose of 1*1016 cm2, while at dose less than 6*1014 cm2 a few C60 molecules remain undestroyed and maintain the original structural properties.

Synthesis, Structure and Magnetism of ErCoIn5

2004 ◽  
Vol 848 ◽  
Author(s):  
Evan Lyle Thomas ◽  
Erin E. Erickson ◽  
Monica Moldovan ◽  
David P. Young ◽  
Julia Y. Chan
Keyword(s):  
Magnetic Properties ◽  
Electrical Resistivity ◽  
Magnetic Susceptibility ◽  
Single Crystal ◽  
Experimental Results ◽  
Flux Growth ◽  
X Ray Diffraction ◽  
Metallic Behavior ◽  
X Ray ◽  
Growth Method

AbstractA new member of the LnMIn5 family, ErCoIn5, has been synthesized by a flux-growth method. The structure of ErCoIn5 was determined by single crystal X-ray diffraction. It crystallizes in the tetragonal space group P4/mmm, Z = 1, with lattice parameters a = 4.5400(4) and c = 7.3970(7) Å, and V = 152.46(2) Å3. Electrical resistivity data show metallic behavior. Magnetic susceptibility measurements show this compound to be antiferromagnetic with TN = 5.1 K. We compare these experimental results with those of LaCoIn5 in an effort to better understand the effect of the structural trends observed on the transport and magnetic properties.

Mass selection of neutral clusters in Low‐Energy Cluster Beam Deposition experiments: Is it realistic?

1994 ◽  
Vol 64 (10) ◽  
pp. 1212-1214 ◽  
Author(s):  
J. F. Roux ◽  
B. Cabaud ◽  
G. Fuchs ◽  
D. Guillot ◽  
A. Hoareau ◽  
...  
Keyword(s):  
Low Energy ◽  
Mass Selection ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Selection Of ◽  
Beam Deposition
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