In-Situ Transmission Electron Microscopy for Analysis of Ion-Beam-Growth Processes

Ion Beam ◽

Ion Beam Sputtering ◽

Ion Beam Etching ◽

Transmission Electron ◽

Beam Sputtering ◽

Electron Microscopy Analysis

AbstractTwo types of systems for in situ transmission electron microscopy analysis of ion-beam etching, ion-beam sputtering and ion-beam assisted deposition are reported. their design, operational features and some applications are presented. Radiation-stimulated diffusion in Mo-Si heterostructure, early growth of ion-beam sputtered in-Sn, in-Sn-O, ZnS:Mn films and recrystallization of ln-Sn-O films during vacuum post-annealing are studied.

Transmission Electron Microscopy Analysis of Mo–W–S–Se Film Sliding Contact Obtained by Using Focused Ion Beam Microscope and In Situ Microtribometer

Tribology Letters ◽

10.1007/s11249-008-9360-z ◽

2008 ◽

Vol 32 (1) ◽

pp. 49-57 ◽

Cited By ~ 39

Author(s):

J. J. Hu ◽

R. Wheeler ◽

J. S. Zabinski ◽

P. A. Shade ◽

A. Shiveley ◽

...

Keyword(s):

Electron Microscopy ◽

Focused Ion Beam ◽

Ion Beam ◽

Sliding Contact ◽

Transmission Electron ◽

Electron Microscopy Analysis ◽

Microscopy Analysis

In-Situ Transmission Electron Microscopy Analysis of a Calcium-Birnessite Water-Oxidation Catalyst

10.29363/nanoge.nfm.2018.147 ◽

2018 ◽

Author(s):

Emanuel Ronge ◽

Vladimir Roddatis ◽

Jonas Ohms ◽

Philipp Kurz ◽

Christian Jooss

Keyword(s):

Electron Microscopy ◽

Water Oxidation ◽

Oxidation Catalyst ◽

Transmission Electron ◽

Electron Microscopy Analysis ◽

Microscopy Analysis

Analysis of rolling contact fatigued microstructure using focused ion beam sputtering and transmission electron microscopy observation Muroga, A. and Saka, H. Script Metall. Mater. (1995) 33 (1), 151–156

International Journal of Fatigue ◽

10.1016/s0142-1123(97)87155-1 ◽

1996 ◽

Vol 18 (8) ◽

pp. 609

Keyword(s):

Electron Microscopy ◽

Focused Ion Beam ◽

Ion Beam ◽

Transmission Electron Microscopy Observation ◽

Rolling Contact ◽

Ion Beam Sputtering ◽

Microscopy Observation ◽

Transmission Electron ◽

Beam Sputtering

Microscopic studies of semiconductor lasers utilizing a combination of transmission electron microscopy, electroluminescence imaging, and focused ion beam sputtering

Applied Physics Letters ◽

10.1063/1.109032 ◽

1993 ◽

Vol 62 (26) ◽

pp. 3408-3410 ◽

Cited By ~ 19

Author(s):

R. Hull ◽

D. Bahnck ◽

F. A. Stevie ◽

L. A. Koszi ◽

S. N. G. Chu

Keyword(s):

Electron Microscopy ◽

Semiconductor Lasers ◽

Focused Ion Beam ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Transmission Electron ◽

Beam Sputtering ◽

Microscopic Studies

In Situ Transmission Electron Microscopy Analysis of Crack Initiation and Propagation Force on Solid Electrolyte Due to Li Dendrite Growth

ECS Meeting Abstracts ◽

10.1149/ma2021-023334mtgabs ◽

2021 ◽

Vol MA2021-02 (3) ◽

pp. 334-334

Author(s):

Megan Diaz ◽

Akihiro Kushima

Keyword(s):

Electron Microscopy ◽

Crack Initiation ◽

Crack Initiation And Propagation ◽

Transmission Electron ◽

Initiation And Propagation ◽

Electron Microscopy Analysis ◽

Microscopy Analysis

Microstructure of polycrystalline near epitaxial (100) and (111) pyrochlore on A (100) MgO Substrate

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100178446 ◽

1990 ◽

Vol 48 (4) ◽

pp. 1062-1063

Author(s):

Shang Hsien Rou

Keyword(s):

Thin Film ◽

Electron Microscopy ◽

Thin Films ◽

Ion Beam ◽

Ion Beam Sputtering ◽

Transmission Electron ◽

Beam Sputtering ◽

Physical Phenomena ◽

Mgo Substrate

New and interesting physical phenomena are being observed via thin film depositions using a variety of processing techniques in different material systems. The present study describes Pb-Zr-Ti-O pyrochlore thin films which were deposited onto (100) MgO substrates using an ion beam sputtering technique. These films are of interest because of their unique microstructure which may provide valuable information in better understanding the epitaxial growth of thin films. Characterization were performed using conventional transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM). Special TEM sample preparation procedures have been developed, which will be reported elsewhere.The as-deposited pyrochlore thin film is near epitaxial and is oriented with both (100) and (111) parallel to the (100) of the MgO substrate. Figure 1(a) shows the selected area diffraction pattern (SADP) of the pyrochlore thin film taken parallel to the [100] zone axis of the substrate.