Large Magnetic Anisotropy in Co3Pt Ordered Phase Thin Films

1998 ◽  
Vol 517 ◽  
Author(s):  
Yoshiyasu Yamada ◽  
Takao Suzuki

AbstractThe very large perpendicular magnetic anisotropy of the order of 2 x 107 erg/cm3 at room temperature was found in CoJ-x Ptx(0<x<0.5) alloy thin films made by e-beam evaporation. The large magnetic anisotropy is likely related to the anisotropic Co-Co bonding distribution, which is similar to the cases of Co/Pt multilayers and FePt alloy thin films. The activation energy estimated for the ordering is approximately 0.3 eV, which is preferably compared to 0.2 eV for FePt. A model is proposed, for which both a short range and long range ordering are present, depending on substrate deposition temperature.

2015 ◽  
Vol 628 ◽  
pp. 263-266 ◽  
Author(s):  
F.T. Yuan ◽  
H.W. Chang ◽  
P.Y. Lee ◽  
C.Y. Chang ◽  
C.C. Chi ◽  
...  

2014 ◽  
Vol 26 (7) ◽  
pp. 2337-2343 ◽  
Author(s):  
Christian Suchomski ◽  
Christian Reitz ◽  
Damir Pajic ◽  
Zvonko Jaglicic ◽  
Igor Djerdj ◽  
...  

AIP Advances ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 025106
Author(s):  
Xinjun Wang ◽  
Sergiy Krylyuk ◽  
Daniel Josell ◽  
Delin Zhang ◽  
Deyuan Lyu ◽  
...  

RSC Advances ◽  
2020 ◽  
Vol 10 (19) ◽  
pp. 11219-11224
Author(s):  
Wei Zhang ◽  
Xiaoxiong Jia ◽  
Rui Wang ◽  
Huihui Liu ◽  
Zhengyu Xiao ◽  
...  

Thin films with perpendicular magnetic anisotropy (PMA) play an essential role in the development of technologies due to their excellent thermal stability and potential application in devices with high density, high stability, and low energy consumption.


1993 ◽  
Vol 126 (1-3) ◽  
pp. 577-579 ◽  
Author(s):  
B.M. Lairson ◽  
M.R. Visokay ◽  
R. Sinclair ◽  
B.M. Clemens

Author(s):  
G.A. Ramírez ◽  
A. Moya-Riffo ◽  
D. Goijman ◽  
J.E. Gómez ◽  
F. Malamud ◽  
...  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Daniel Lordan ◽  
Guannan Wei ◽  
Paul McCloskey ◽  
Cian O’Mathuna ◽  
Ansar Masood

AbstractThe emergence of perpendicular magnetic anisotropy (PMA) in amorphous thin films, which eventually transforms the magnetic spins form an in-plane to the out-of-plane configuration, also known as a spin-reorientation transition (SRT), is a fundamental roadblock to attain the high flux concentration advantage of these functional materials for broadband applications. The present work is focused on unfolding the origin of PMA in amorphous thin films deposited by magnetron sputtering. The amorphous films were deposited under a broad range of sputtering pressure (1.6–6.2 mTorr), and its effect on the thin film growth mechanisms was correlated to the static global magnetic behaviours, magnetic domain structure, and dynamic magnetic performance. The films deposited under low-pressure revealed a dominant in-plane uniaxial anisotropy along with an emerging, however feeble, perpendicular component, which eventually evolved as a dominant PMA when deposited under high-pressure sputtering. This change in the nature of anisotropy redefined the orientation of spins from in-plane to out-of-plane. The SRT in amorphous films was attributed to the dramatic change in the growth mechanism of disorder atomic structure from a homogeneously dispersed to a porous columnar microstructure. We suggest the origin of PMA is associated with the columnar growth of the amorphous films, which can be eluded by a careful selection of a deposition pressure regime to avoid its detrimental effect on the soft magnetic performance. To the author’s best knowledge, no such report links the sputtering pressure as a governing mechanism of perpendicular magnetisation in technologically important amorphous thin films.


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