Positron Studies of Defects in Nitrogen and Carbon Implanted Titanium

1998 ◽  
Vol 527 ◽  
Author(s):  
M. Soltani-Farshi ◽  
H. Baumann ◽  
W. Anwand ◽  
G. Brauer ◽  
P.G. Coleman ◽  
...  

ABSTRACTModification of materials by ion beams creates defects and defect formation processes. The implantation of nitrogen into titanium influences the hydrogen content in this metal. Hydrogen accumulation enhances hydrogenations in the implanted region. This effect may have important consequences, because excessive hydrogen accumulation generally leads to precipitating hydrids in the matrix lattice and the metal undergoes degradation of its mechanical properties. Many studies have shown that defects in metals trap light gas atoms like H or He which are solved or implanted in the sample. Therefore, the decoration of defects with these atoms is a method to trace defect concentrations and to study the trapping and detrapping mechanism. Mobile defects can be trapped at implanted atoms, at inhomogeneities or at inner surfaces like grain boundaries or interfaces of different phases. Using the slow positron beam technique the traps for hydrogen attributed to vacancy-type defects have been investigated in cp-Ti implanted with nitrogen or carbon.The concentration of hydrogen has been detected by the 15N profiling technique (1H(15N,αγ)12C). The nitrogen and carbon content were measured by 15N(1H,αγ)12C and 13C(p,γ)14N reaction, respectively.

2000 ◽  
Vol 643 ◽  
Author(s):  
K. Sato ◽  
H. Uchiyama ◽  
I. Kanazawa ◽  
R. Tamura ◽  
K. Kimura ◽  
...  

AbstractIcosahedral quasicrystals Al71.5Pd20.3Mn8.2, Al70.7Pd21.34Re7.96, Al62.5Cu25.5Fe12.5, and α-Al68.31Mn21.21Si10.48 1/1- approximant were investigated by using a monoenergetic slow positron beam. The structural vacancy densities in the first three samples were determined to be 5.0×1020, 7.7×1020, and 4.7×1020 cm−3, respectively, by analyzing the measured S-parameter.


2008 ◽  
Vol 607 ◽  
pp. 152-154
Author(s):  
Wen Deng ◽  
Li Yue ◽  
Yu Xia Li ◽  
Xu Xin Cheng ◽  
Ya Qin Wei ◽  
...  

Slow positron beam technique has been applied to measure the Doppler broadening spectra for single crystals of Cu, SiO2, graphite, virgin Si, and Si without oxide film. The results show that the Cu ratio curve shows a high peak due to Cu having 10 electrons in the 3d shells. The ratio curve of SiO2 is higher than that of graphite. For the single crystal of Cu, SiO2, graphite, and Si without oxide film, the S (W) parameters decrease (increase) as positron implantation energy increasing. Defects on the surface lead to higher S (lower W) value. For the virgin Si and the thermally grown SiO2-Si samples, the S (W) parameters increase (decrease) as positron implantation energy increasing. It can be due to Si atom at surface, with two dangling bonds, tend to form silicon oxide with O. The W parameter for the single crystal of Cu is relatively high as compared with that of the single crystals of SiO2 and graphite.


2015 ◽  
Vol 64 (24) ◽  
pp. 247804
Author(s):  
Hu Yuan-Chao ◽  
Cao Xing-Zhong ◽  
Li Yu-Xiao ◽  
Zhang Peng ◽  
Jin Shuo-Xue ◽  
...  

1995 ◽  
Vol 85 ◽  
pp. 329-333 ◽  
Author(s):  
N. Oshima ◽  
T. Nakajyo ◽  
I. Kanazawa ◽  
T. Iwashita ◽  
Y. Ito ◽  
...  

2003 ◽  
Vol 68 (3-4) ◽  
pp. 599-603 ◽  
Author(s):  
Y.C. Wu ◽  
R. Zhang ◽  
H. Chen ◽  
Y. Li ◽  
J. Zhang ◽  
...  

2001 ◽  
Vol 363-365 ◽  
pp. 481-483 ◽  
Author(s):  
K. Sato ◽  
H. Uchiyama ◽  
Y. Takahashi ◽  
Ikuzo Kanazawa ◽  
R. Tamura ◽  
...  

1997 ◽  
Vol 116 ◽  
pp. 263-267 ◽  
Author(s):  
Mutsumi Tashiro ◽  
Terunobu Nakajyo ◽  
Yusuke Murashige ◽  
Tomoya Koizumi ◽  
Ikuzo Kanazawa ◽  
...  

1999 ◽  
Vol 12 (5) ◽  
pp. 743-745
Author(s):  
Mutsumi Tashiro ◽  
Pradeep K. Pujari ◽  
Shu Seki ◽  
Yoshihide Honda ◽  
Tomohiro Yamaguchi ◽  
...  

2004 ◽  
Vol 445-446 ◽  
pp. 322-324
Author(s):  
P.E. Mallon ◽  
T.H. Berhane ◽  
C.J. Greyling ◽  
W.L. Vosloo ◽  
H. Chen ◽  
...  

2008 ◽  
Vol 607 ◽  
pp. 149-151 ◽  
Author(s):  
Yu Yang Huang ◽  
Zhen Ying Chen ◽  
Ya Qin Wei ◽  
Yu Xia Li ◽  
Wen Deng

Slow positron beam technique has been employed to study the defects of graphite, nanophase C, as well as the structural changes in un-doped, B-doped and S-doped diamond films with annealing temperatures. The results show that the concentration of defects in nanophase C is higher than that in graphite. The vacancy concentration in the S-doped diamond film is higher than that in un-doped one. The addition of small amount of B atoms leads to the decrease of the vacancy concentration in the film. The vacancy concentration in un-doped diamond film would decrease after annealing at temperature below 600°C, while vacancy concentration will increase after annealing at temperatures above 900°C. The vacancy concentration in the 40 Ω cm B-doped diamond film decreases at annealing temperatures higher than 200°C.


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