scholarly journals Low-Loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-Length and a Sub-Nanometer Surface Roughness

Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by the chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides is determined to be 0.452 nm with an atomic force microscope (AFM). The approach is compatible with other surface patterning technologies such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.


Author(s):  
Kevin Luke ◽  
Prashanta Kharel ◽  
Christian Reimer ◽  
Lingyan He ◽  
Marko Loncar ◽  
...  

2021 ◽  
Author(s):  
Hongyan Yu ◽  
Xinyu Sun ◽  
Dasai Ban ◽  
Feng Qiu

Abstract Transmission of the fundamental mode in multi-mode waveguides is an effective scheme for a silicon-based platform to reduce scattering loss. However, the application of the scheme is usually limited to straight waveguides and restricted in multi-mode bending waveguides. This is because the fundamental mode of a straight waveguide is seriously disordered after passing the bend. In this work, we have presented a “matched bending radius” approach, by which an ultra-low loss and negligible modal disorder have been demonstrated in the Si and Si3N4 multi-mode waveguides. The estimated optical field overlap factor is almost 0 dB at the matched bending radius, indicating that the fundamental mode can be re-generated after passing the multi-mode bending waveguide. The proposed approach will contribute to applying the low loss scheme in large-scale photonic integrated circuits.


2020 ◽  
Vol 28 (17) ◽  
pp. 24452 ◽  
Author(s):  
Kevin Luke ◽  
Prashanta Kharel ◽  
Christian Reimer ◽  
Lingyan He ◽  
Marko Loncar ◽  
...  

2019 ◽  
Vol 44 (9) ◽  
pp. 2314 ◽  
Author(s):  
Lingyan He ◽  
Mian Zhang ◽  
Amirhassan Shams-Ansari ◽  
Rongrong Zhu ◽  
Cheng Wang ◽  
...  

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