Evaluation of the Use of Sputter Profiling with XPS or AES for the Study of Surface Carburization Resulting from High Energy (>20 keV) Ion Implantation
1997 ◽
Vol 127-128
◽
pp. 388-392
◽
Keyword(s):
1998 ◽
Vol 146
(1-4)
◽
pp. 323-328
◽
1993 ◽
Vol 32
(Part 1, No. 1B)
◽
pp. 303-307
◽
2002 ◽
Vol 15
(4)
◽
pp. 289-300
2009 ◽
Vol 389
(2)
◽
pp. 248-253
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