Thermal Relaxation Processes and Stability in Poled Electro-Optic Polymers

1997 ◽  
Author(s):  
Kenneth D. Singer
Keyword(s):  
Thermal Relaxation ◽  
Relaxation Processes ◽  
Electro Optic

THERMAL DECAY OF ISOLATED SINGLE SILICON MOUNDS ON Si(111) SURFACES

2000 ◽  
Vol 07 (05n06) ◽  
pp. 571-575
Author(s):  
A. ICHIMIYA ◽  
K. HAYASHI
Keyword(s):  
Scanning Tunneling Microscope ◽  
Formation Energy ◽  
Three Dimensional ◽  
Thermal Relaxation ◽  
Stacking Fault ◽  
Scanning Tunneling ◽  
Relaxation Processes ◽  
Layer By Layer ◽  
Temperature Variable ◽  
Production Probability

Isolated three-dimensional (3D) silicon mounds on the Si (111)(7×7) surface have been produced using the tip of a scanning tunneling microscope (STM) at temperatures between 700 K and 750 K. Thermal relaxation processes of the mounds have been investigated by a temperature-variable STM. The 3D mounds formed by the STM tip are like pyramids with certain facets for both surfaces. The indices of the main facets of the mounds on the Si (111) surface are {311}, and those of the small facets are {221} or {331}. Two types of pyramids are produced on the Si (111). The pyramids with a production probability of 75% are normal stacking at the interface between the mound and the substrate, and are called type U. For mounds with a production probability of 25% which are in the twin relation of the type U mounds, there is a stacking fault at the interface, and they are called type F. The formation energy of the stacking fault is estimated from the ratio of the production probability as 4.7 meV/Å2. The decay rate of the type F mounds is about three times larger than that of the type U ones. During decomposition of the type U mounds, the facets of the pyramid are split into two parts. For the type F mounds, the pyramids decay nearly layer by layer without splitting of the facets and step bunching.

Structural Relaxation of Densified Silica Glass by Thermal Annealing

1995 ◽  
Vol 407 ◽  
Author(s):  
Naoyuki Kitamura ◽  
Kohei Fukumi ◽  
Masaki Makihara ◽  
Hiroshi Yamashita
Keyword(s):  
Thermal Annealing ◽  
Glass Structure ◽  
Hot Isostatic Pressing ◽  
Thermal Relaxation ◽  
Relaxation Processes ◽  
Relaxation Rates ◽  
Fast Process ◽  
Main Band ◽  
Mean Values ◽  
Density State

ABSTRACTThermal relaxation of glass structure has been studied on silica glasses densified by hot isostatic pressing. Density of the glasses relaxed toward the value of an undensified glass by thermal annealing. Relaxation rates of density of the glasses were measured after the annealing at several temperatures. Fast and slow relaxation processes were found from the analysis by using a stretched exponential relaxation function Φ(t)=exp{−(t/τeffβ}). The slow process becomes dominant after the fast process. Raman scattering spectrum also has been measured through the thermal relaxation. The width of the main band at 450cm−1 increased by the annealing and recovered the value for the undensified glass after the fast process. The bands at 1060 and 1200 cm−1 shifted back to the positions for the undensified glass. The high density state(Δρ/ρ∼0.5%), however, was maintained even after the fast process. From these results, it is deduced that the fast process is due to the recovery of the O3Si-O-SiO3 tilt angle and Si-O-Si bond angle to the mean values for the undensified glass.

Study of thermal relaxation processes in life tissues by blood pulsation imaging technique

2019 ◽  
Author(s):  
Lyudmila P. Lyakhova ◽  
Anjelika V. Belaventseva ◽  
Roman V. Romashko ◽  
Yuri N. Kulchin ◽  
Alexei A. Kamshilin ◽  
...  
Keyword(s):  
Imaging Technique ◽  
Thermal Relaxation ◽  
Relaxation Processes

scholarly journals Quantum heat distribution in thermal relaxation processes

2019 ◽  
Vol 99 (2) ◽  
Author(s):  
D. S. P. Salazar ◽  
A. M. S. Macêdo ◽  
G. L. Vasconcelos
Keyword(s):  
Thermal Relaxation ◽  
Relaxation Processes ◽  
Heat Distribution

Analysis of thermal relaxation processes

1967 ◽  
Vol 5 (3) ◽  
pp. 449-455 ◽  
Author(s):  
R. Holmes ◽  
M.A. Stott
Keyword(s):  
Thermal Relaxation ◽  
Relaxation Processes

Fluorescence spectroscopy and thermal relaxation processes of anthracenyl-labeled polysiloxanes

2009 ◽  
Vol 48 (1) ◽  
pp. 74-81 ◽  
Author(s):  
Raquel Aparecida Domingues ◽  
Inez Valéria Pagotto Yoshida ◽  
Teresa Dib Zambon Atvars
Keyword(s):  
Fluorescence Spectroscopy ◽  
Thermal Relaxation ◽  
Relaxation Processes

scholarly journals Model Atmospheres with Periodic Shocks

1989 ◽  
Vol 106 ◽  
pp. 269-283
Author(s):  
G. H. Bowen
Keyword(s):  
Mass Loss ◽  
Variable Star ◽  
Outer Region ◽  
Thermal Relaxation ◽  
Relaxation Processes ◽  
Long Period ◽  
Period Variable ◽  
Evolutionary Consequences ◽  
Dependent Processes ◽  
Rapid Mass

AbstractThe pulsation of a long-period variable star generates shock waves which dramatically affect the structure of the star's atmosphere and produce conditions that lead to rapid mass loss. Numerical modeling of atmospheres with periodic shocks is being pursued to increase our understanding of the processes involved and of the evolutionary consequences for the stars. It is characteristic of these complex dynamical systems that most effects result from the interaction of various time-dependent processes. For example, rapid mass loss in the models is a joint consequence of the enormous extension of the atmosphere caused by shocks, and of radiation pressure on grains formed in the cool outer region; it is also affected by thermal relaxation processes, which determine the temperature distribution. The progress and significance of these modeling calculations will be reviewed.

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