scholarly journals Characteristics of fused silica as optical material for excimer laser beam. Effect of annealing in various atmosphares on the characteristics of absorption and emission bands induced by ArF excimer laser irradiation.

1991 ◽  
Vol 19 (2) ◽  
pp. 177-184 ◽  
Author(s):  
Nobu KUZUU ◽  
Yoshikazu KOMATSU ◽  
Masataka MURAHARA
Keyword(s):  
Laser Beam ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Fused Silica ◽  
Optical Material ◽  
Absorption And Emission ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser

Surface Alteration of Amorphous Si3N4 Films by ArF Excimer Laser Irradiation

1995 ◽  
Vol 34 (Part 2, No. 11A) ◽  
pp. L1482-L1485 ◽  
Author(s):  
Kazuo Nakamae ◽  
Kou Kurosawa ◽  
Yasuo Takigawa ◽  
Wataru Sasaki ◽  
Yasukazu Izawa ◽  
...  
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Surface Alteration ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser ◽  
Amorphous Si3n4

Fluorine‐enhanced photo‐oxidation of silicon under ArF excimer laser irradiation in an O2+NF3gas mixture

1986 ◽  
Vol 49 (12) ◽  
pp. 699-700 ◽  
Author(s):  
M. Morita ◽  
S. Aritome ◽  
T. Tanaka ◽  
M. Hirose
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Photo Oxidation ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser

Transient absorption and fluorescence spectroscopy in fused silica induced by pulsed KrF excimer laser irradiation

1991 ◽  
Vol 59 (26) ◽  
pp. 3369-3371 ◽  
Author(s):  
N. Leclerc ◽  
C. Pfleiderer ◽  
J. Wolfrum ◽  
K. Greulich ◽  
W. P. Leung ◽  
...  
Keyword(s):  
Fluorescence Spectroscopy ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Transient Absorption ◽  
Fused Silica ◽  
Absorption And Fluorescence Spectroscopy ◽  
Excimer Laser Irradiation ◽  
Krf Excimer Laser

Improved Abruptness of Si/Sin Interface by ArF Excimer-Laser Pre-Annealing to Sin

1994 ◽  
Vol 345 ◽  
Author(s):  
Yasutaka Uchida ◽  
Masakiyo Matsumura
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Field Effect ◽  
Field Effect Mobility ◽  
Resolution Limit ◽  
Laser Recrystallization ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser ◽  
Krf Excimer Laser ◽  
Film Annealing

AbstractXPS measurement showed that undesirable SiNH component was reduced drastically from the low-temperature deposited SiN surface by intense ArF excimer-laser irradiation. Although the improved layer was as thin as 15nm, it was very effective to stop diffusion of N atoms from the bottom SiN layer to the top Si layer during the excimer-laser recrystallization step. N-diffused Si layer at the Si/SiN interface was less than the XPS resolution limit for the pre-annealed SiN structure, but about 5nm thick. As a result, the field-effect mobility of the poly-Si/SiN TFT was increased drastically by laser-irradiation to SiN film. Annealing characteristics are also presented for the various SiN film thicknesses and for both the ArF and KrF excimer-laser lights.

Carbon Film Synthesis on the Water by Excimer Laser Irradiation

1998 ◽  
Vol 555 ◽  
Author(s):  
H. Hidai ◽  
H. Tokura
Keyword(s):  
Raman Spectrum ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Carbon Film ◽  
Carbon Films ◽  
Elementary Analysis ◽  
Excimer Laser Irradiation ◽  
Ft Ir ◽  
Arf Excimer Laser ◽  
Film Synthesis

AbstractWater was used as a substrate and carbon films were obtained from methane gas on the water by ArF excimer laser. The film was analyzed by a SEM, elementary analysis, Raman spectrum and FT-IR. Moreover synthesized position of the film was studied.

Whiskerlike structure growth on silicon exposed to ArF excimer laser irradiation

1996 ◽  
Vol 69 (5) ◽  
pp. 620-622 ◽  
Author(s):  
F. Sánchez ◽  
J. L. Morenza ◽  
R. Aguiar ◽  
J. C. Delgado ◽  
M. Varela
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser

Photoabsorption of Synthetic Silica Glass under ArF Excimer Laser Irradiation

2001 ◽  
Vol 40 (Part 1, No. 10) ◽  
pp. 5962-5965 ◽  
Author(s):  
Masaru Shimbo ◽  
Toshio Nakajima ◽  
Naoki Tsuji ◽  
Tsutomu Kakuno ◽  
Takashi Obara
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Silica Glass ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser

scholarly journals Processing of CVD Diamond by ArF Excimer Laser Irradiation.

1995 ◽  
Vol 61 (3) ◽  
pp. 406-410
Author(s):  
Hiroaki SUZUKI ◽  
Atsushi HIRATA ◽  
Hitoshi TOKURA ◽  
Masanori YOSHIKAWA
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Cvd Diamond ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser
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