scholarly journals Generalized Cauchy integrals on the plane

Filomat ◽  
2018 ◽  
Vol 32 (3) ◽  
pp. 1107-1116
Author(s):  
Viktor Polunin ◽  
Alexandre Soldatov
Keyword(s):  
Differentiation Formula ◽  
Plemelj Formula ◽  
Smooth Contour ◽  
Cauchy Integrals ◽  
Boundary Properties

The integrals with homogeneous-difference kernels are considered on a smooth contour. The boundary properties of the integrals are described in the H?lder space. An analogue of the known Sokhotski-Plemelj formula is obtained. Moreover, the differentiation formula of these integrals is also given.

Metal Microstructures in Advanced CMOS Devices

1996 ◽  
Vol 54 ◽  
pp. 358-359
Author(s):  
L. M. Gignac ◽  
K. P. Rodbell
Keyword(s):  
Grain Boundaries ◽  
Semiconductor Device ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Metal Films ◽  
Thin Metal ◽  
Electrical Performance ◽  
Thin Metal Films ◽  
Chemical Vapor Deposited ◽  
Boundary Properties

As advanced semiconductor device features shrink, grain boundaries and interfaces become increasingly more important to the properties of thin metal films. With film thicknesses decreasing to the range of 10 nm and the corresponding features also decreasing to sub-micrometer sizes, interface and grain boundary properties become dominant. In this regime the details of the surfaces and grain boundaries dictate the interactions between film layers and the subsequent electrical properties. Therefore it is necessary to accurately characterize these materials on the proper length scale in order to first understand and then to improve the device effectiveness. In this talk we will examine the importance of microstructural characterization of thin metal films used in semiconductor devices and show how microstructure can influence the electrical performance. Specifically, we will review Co and Ti silicides for silicon contact and gate conductor applications, Ti/TiN liner films used for adhesion and diffusion barriers in chemical vapor deposited (CVD) tungsten vertical wiring (vias) and Ti/AlCu/Ti-TiN films used as planar interconnect metal lines.

Sintering and Grain Boundary Properties of ZnO-Bi2O3-Sb2O3-Mn3O4-NiO Varistors

2013 ◽  
Vol 51 (5) ◽  
pp. 363-369
Author(s):  
Youn-Woo Hong ◽  
Young-Jin Lee ◽  
Sei-Ki Kim ◽  
Jin-Ho Kim
Keyword(s):  
Grain Boundary ◽  
Boundary Properties

Light Effects on Grain Boundary Properties in Silicon

1981 ◽  
Vol 5 ◽  
Author(s):  
L. J. Cheng ◽  
C. M. Shyu
Keyword(s):  
Experimental Data ◽  
Grain Boundary ◽  
Minority Carrier ◽  
State Density ◽  
Boundary State ◽  
Carrier Recombination ◽  
Boundary Properties ◽  
Light Effects ◽  
Recombination Velocity ◽  
P Type

ABSTRACTWe have studied the photoconductivity of grain boundaries in p–type silicon. The result demonstrates the applicability of the technique for the measurement of minority carrier recombination velocity at the grain boundary. The experimental data are consistent with the thought that the recombination velocity increases with the boundary state density and light intensity.

Sign in / Sign up

Export Citation Format

Share Document