scholarly journals Molecular simulation study of 1,5-diphenylcarbazide self-assembled monolayers on a copper surface

2007 ◽  
Vol 72 (5) ◽  
pp. 475-484 ◽  
Author(s):  
Guangzeng Liu ◽  
Shenhao Chen ◽  
Ma Hongfang ◽  
Xiuyu Liu
Keyword(s):  
Phenyl Ring ◽  
Adsorption Process ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Synergy Effect ◽  
High Coverage ◽  
Parallel Orientation ◽  
Strong Adsorption ◽  
Assembled Monolayers ◽  
Self Assembled

In this study, the adsorption process of 1,5- diphenylcarbazide (DPC) self-assembled monolayers on a copper surface was investigated by using molecular mechanics. The results indicated that the interaction of the ?-electrons in the -NH-NH- group and the ?-electrons in the phenyl ring could lead to strong adsorption of the highly symmetric DPC molecules on a copper surface. The synergy effect of the phenyl ring and the -NH-NH- group made the whole DPC molecule lay in parallel orientation on a copper surface when the coverage was low. However, at high coverage, the phenyl ring was slightly tilted because of the repulsion of the DPC molecules, while the -NH-NH- groups remained parallel to the copper surface.

Copper surface protection by organothiol self-assembled monolayers

2015 ◽  
Vol 1746 ◽  
Author(s):  
Sira Suren ◽  
Supattra Haokratoke ◽  
Soorathep Kheawhom
Keyword(s):  
Corrosion Inhibition ◽  
Coating Layer ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Oxygen Plasma Treatment ◽  
Water Contact ◽  
Surface Protection ◽  
Assembled Monolayers ◽  
Forming Temperature ◽  
Self Assembled

ABSTRACTThis work investigates the effects of concentration of organothiol molecules and temperature used during self-assembled monolayers (SAMs) formation on quality of the organothiol SAMs coating layer obtained in terms of wettability, corrosion inhibition efficiency and carbon to copper ratio. The organothiol SAMs were coated on copper substrates prepared by electro-polishing followed by oxygen plasma treatment for 15 s. Three types of organothiol SAMs including 1-octanethiol (OTT), 2-ethylhexanethiol (2-EHT) and 2-phenylethanethiol (2-PET) were investigated. Concentration of organothiol molecules ranging from 0.005 to 0.02 M in isopropanol and forming temperature ranging from -15 to 50°C were studied. It was found that all organothiol SAMs of 0.01 M provided the SAMs coating layer with the highest quality. The SAMs formed at 40°C with OTT and 2-EHT, and at 0°C with 2-PET were the most favorable condition with the highest water contact angle of 124.79o, 130.66o and 120.58o at corrosion inhibition efficiencies of 96.24%, 99.37% and 98.90%, respectively.

Scanning Tunneling Microscopic Observation of Adatom-Mediated Motifs on Gold−Thiol Self-Assembled Monolayers at High Coverage

2009 ◽  
Vol 113 (45) ◽  
pp. 19601-19608 ◽  
Author(s):  
Yun Wang ◽  
Qijin Chi ◽  
Noel S. Hush ◽  
Jeffrey R. Reimers ◽  
Jingdong Zhang ◽  
...  
Keyword(s):  
Microscopic Observation ◽  
Self Assembled Monolayers ◽  
Scanning Tunneling ◽  
High Coverage ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

2012 ◽  
Vol 3 ◽  
pp. 101-113 ◽  
Author(s):  
Zhe She ◽  
Andrea DiFalco ◽  
Georg Hähner ◽  
Manfred Buck
Keyword(s):  
Electron Beam ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Metal Structures ◽  
Step Procedure ◽  
Assembled Monolayers ◽  
Polycrystalline Gold ◽  
Self Assembled ◽  
Lift Off ◽  
Surface Morphologies

Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.

Self-Assembled Monolayers of Schiff Base on the Surfaces of Oxidized Copper

2008 ◽  
Vol 373-374 ◽  
pp. 649-653
Author(s):  
Dang Gang Li ◽  
Xian Jin Yu ◽  
Y.H. Dong ◽  
L.P. Zhang ◽  
Zeng Dian Zhao
Keyword(s):  
Schiff Base ◽  
Photoelectron Spectroscopy ◽  
Copper Surface ◽  
The Self ◽  
Polarization Curves ◽  
Self Assembled Monolayers ◽  
Surface Films ◽  
Assembled Monolayers ◽  
Interface Capacitance ◽  
Self Assembled

The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper. Schiff base used in this paper is N-2-hydroxyphenyl- (3-methoxy-salicylidenimine), designated V-bso. X-ray photoelectron spectroscopy (XPS), polarization curves, electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure, formation and composition of these monolayers. XPS analysis show that the valence of the copper in the surface films is +2. The polarization curves and the EIS results indicate that the films of CuO, V-bso, and V-bso modified oxidized copper all have good corrosion inhibition efficiency. The IE of the V-bso modified oxidized copper is higher than that of the V-bso modified copper and the oxidized copper layer, just because the former has two layers. The results of the interface capacitance show that the self-assemble films of the V-bso on the oxidized copper surface have good potential stability.

Co-adsorption process of molecules in relation to formation of one dimensional structures in the self-assembled monolayers on Au(111)

1999 ◽  
Vol 144-145 ◽  
pp. 439-444 ◽  
Author(s):  
Takao Ishida ◽  
Wataru Mizutani ◽  
Hiroaki Azehara ◽  
Hirofumi Hokari ◽  
Uichi Akiba ◽  
...  
Keyword(s):  
Adsorption Process ◽  
Co Adsorption ◽  
The Self ◽  
Self Assembled Monolayers ◽  
One Dimensional ◽  
Assembled Monolayers ◽  
Self Assembled

Cleaning and Passivation of Copper Surface Using N2H4, and Self-Assembled Monolayers for Area-Selective Atomic Layer Deposition (AS-ALD) Applications

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1663-1663
Author(s):  
Su Min Hwang ◽  
Jin-Hyun Kim ◽  
Sang Woo Kim ◽  
Yong Chan Jung ◽  
Jean-Francois Veyan ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

Inhibitive Effect of the Self-assembled Monolayers of Dithiocarbamate Modified Glucose on Copper Surface

2013 ◽  
Vol 30 (5) ◽  
pp. 596
Author(s):  
Shenyang ZHANG ◽  
Qiangqiang LIAO ◽  
Shaodi XU ◽  
Dong YANG ◽  
Lulu ZHAO ◽  
...  
Keyword(s):  
Copper Surface ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Preparation of High-Coverage Fluorinated Decyltrichlorosilane Self-Assembled Monolayers

2016 ◽  
Vol 32 (5) ◽  
pp. 1221-1226
Author(s):  
Jia-Dong ZHOU ◽  
◽  
Yi-Hui DONG ◽  
Shuai-Hui ZHANG ◽  
Yuan-Yuan ZHAO ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
High Coverage ◽  
Assembled Monolayers ◽  
Self Assembled
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