Inhibitive Effect of the Self-assembled Monolayers of Dithiocarbamate Modified Glucose on Copper Surface

2013 ◽  
Vol 30 (5) ◽  
pp. 596
Author(s):  
Shenyang ZHANG ◽  
Qiangqiang LIAO ◽  
Shaodi XU ◽  
Dong YANG ◽  
Lulu ZHAO ◽  
...  
Keyword(s):  
Copper Surface ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Self-Assembled Monolayers of Schiff Base on the Surfaces of Oxidized Copper

2008 ◽  
Vol 373-374 ◽  
pp. 649-653
Author(s):  
Dang Gang Li ◽  
Xian Jin Yu ◽  
Y.H. Dong ◽  
L.P. Zhang ◽  
Zeng Dian Zhao
Keyword(s):  
Schiff Base ◽  
Photoelectron Spectroscopy ◽  
Copper Surface ◽  
The Self ◽  
Polarization Curves ◽  
Self Assembled Monolayers ◽  
Surface Films ◽  
Assembled Monolayers ◽  
Interface Capacitance ◽  
Self Assembled

The Self-assembled monolayers (SAMs) of Schiff base had been formed on oxidized surfaces of copper. Schiff base used in this paper is N-2-hydroxyphenyl- (3-methoxy-salicylidenimine), designated V-bso. X-ray photoelectron spectroscopy (XPS), polarization curves, electrochemistry impedance spectroscopy (EIS) and the interface capacitance measurements have been employed to investigate the structure, formation and composition of these monolayers. XPS analysis show that the valence of the copper in the surface films is +2. The polarization curves and the EIS results indicate that the films of CuO, V-bso, and V-bso modified oxidized copper all have good corrosion inhibition efficiency. The IE of the V-bso modified oxidized copper is higher than that of the V-bso modified copper and the oxidized copper layer, just because the former has two layers. The results of the interface capacitance show that the self-assemble films of the V-bso on the oxidized copper surface have good potential stability.

Comparative Molecular Dynamics Study of Aβ Adsorption on the Self-Assembled Monolayers

Langmuir ◽  
2010 ◽  
Vol 26 (5) ◽  
pp. 3308-3316 ◽  
Author(s):  
Qiuming Wang ◽  
Chao Zhao ◽  
Jun Zhao ◽  
Jingdai Wang ◽  
Jui-Chen Yang ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals STM visualisation of counterions and the effect of charges on self-assembled monolayers of macrocycles

2011 ◽  
Vol 2 ◽  
pp. 674-680 ◽  
Author(s):  
Tibor Kudernac ◽  
Natalia Shabelina ◽  
Wael Mamdouh ◽  
Sigurd Höger ◽  
Steven De Feyter
Keyword(s):  
Self Assembly ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Assembly Process ◽  
Organic Monolayers ◽  
Preferential Adsorption ◽  
Scanning Tunnelling ◽  
Assembled Monolayers ◽  
Tunnelling Microscopy ◽  
Self Assembled

Despite their importance in self-assembly processes, the influence of charged counterions on the geometry of self-assembled organic monolayers and their direct localisation within the monolayers has been given little attention. Recently, various examples of self-assembled monolayers composed of charged molecules on surfaces have been reported, but no effort has been made to prove the presence of counterions within the monolayer. Here we show that visualisation and exact localisation of counterions within self-assembled monolayers can be achieved with scanning tunnelling microscopy (STM). The presence of charges on the studied shape-persistent macrocycles is shown to have a profound effect on the self-assembly process at the liquid–solid interface. Furthermore, preferential adsorption was observed for the uncharged analogue of the macrocycle on a surface.

Copper surface protection by organothiol self-assembled monolayers

2015 ◽  
Vol 1746 ◽  
Author(s):  
Sira Suren ◽  
Supattra Haokratoke ◽  
Soorathep Kheawhom
Keyword(s):  
Corrosion Inhibition ◽  
Coating Layer ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Oxygen Plasma Treatment ◽  
Water Contact ◽  
Surface Protection ◽  
Assembled Monolayers ◽  
Forming Temperature ◽  
Self Assembled

ABSTRACTThis work investigates the effects of concentration of organothiol molecules and temperature used during self-assembled monolayers (SAMs) formation on quality of the organothiol SAMs coating layer obtained in terms of wettability, corrosion inhibition efficiency and carbon to copper ratio. The organothiol SAMs were coated on copper substrates prepared by electro-polishing followed by oxygen plasma treatment for 15 s. Three types of organothiol SAMs including 1-octanethiol (OTT), 2-ethylhexanethiol (2-EHT) and 2-phenylethanethiol (2-PET) were investigated. Concentration of organothiol molecules ranging from 0.005 to 0.02 M in isopropanol and forming temperature ranging from -15 to 50°C were studied. It was found that all organothiol SAMs of 0.01 M provided the SAMs coating layer with the highest quality. The SAMs formed at 40°C with OTT and 2-EHT, and at 0°C with 2-PET were the most favorable condition with the highest water contact angle of 124.79o, 130.66o and 120.58o at corrosion inhibition efficiencies of 96.24%, 99.37% and 98.90%, respectively.

Alignment of Surface-Stabilized Ferroelectric Liquid Crystal by the Self-Assembled Monolayers of Amphiphilic Diacetylene Derivatives

1994 ◽  
Vol 33 (Part 1, No.1A) ◽  
pp. 295-301 ◽  
Author(s):  
Toshihiko Tanaka ◽  
Yoshiaki Honda ◽  
Takeshi Tani ◽  
Atsushi Terahara ◽  
Yuka Tabe ◽  
...  
Keyword(s):  
Liquid Crystal ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Ferroelectric Liquid Crystal ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

2012 ◽  
Vol 3 ◽  
pp. 101-113 ◽  
Author(s):  
Zhe She ◽  
Andrea DiFalco ◽  
Georg Hähner ◽  
Manfred Buck
Keyword(s):  
Electron Beam ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Metal Structures ◽  
Step Procedure ◽  
Assembled Monolayers ◽  
Polycrystalline Gold ◽  
Self Assembled ◽  
Lift Off ◽  
Surface Morphologies

Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.

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