scholarly journals Recent Plasma Processing Technology. Radical Measurements in Plasmas for Semiconductor Processing using Laser Spectroscopic Techniques.

1994 ◽  
Vol 60 (11) ◽  
pp. 1549-1553
Author(s):  
Toshio GOTO
2000 ◽  
Vol 121 (1-2) ◽  
pp. 367-377 ◽  
Author(s):  
A. Brockhinke ◽  
S. Haufe ◽  
K. Kohse-Höinghaus

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