scholarly journals Study on In-Process Measurement of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern. 2nd Report. Fast Defect Measurement Method using LSDP.

2002 ◽  
Vol 68 (7) ◽  
pp. 962-966 ◽  
Author(s):  
Satoru TAKAHASHI ◽  
Takashi MIYOSHI ◽  
Yasuhiro TAKAYA ◽  
Yasufumi TATSUNO
Keyword(s):  
Silicon Wafer ◽  
Measurement Method ◽  
Surface Defects ◽  
Wafer Surface ◽  
Process Measurement ◽  
Silicon Wafer Surface ◽  
Defect Pattern

Automatic Defects Measurement on Silicon Wafer Surface by Laser Scattered Defect Pattern

2000 ◽  
Author(s):  
Satoru Takahashi ◽  
Takashi Miyoshi ◽  
Yasuhiro Takaya
Keyword(s):  
Silicon Wafer ◽  
Measurement Method ◽  
Optical Measurement ◽  
Experimental System ◽  
Wafer Surface ◽  
Objective Lens ◽  
Two Stage ◽  
Process Measurement ◽  
Defect Pattern ◽  
Wafer Surfaces

Abstract A new optical measurement method for evaluating the defects on silicon wafer surfaces quantitatively, applicable to in-process measurement, is presented. The experimental system for measuring the defects consists of a Fourier transform optical system using a high-power objective lens. In order to verify the feasibility of the applications of this method to automatic in-process measurement, a two-stage measurement for detecting and evaluating small particles, which are typical defects on silicon wafer surfaces, was carried out. The results showed that the proposed two-stage measurement method is effective for measuring small defects in the sub-micro meter scale size.

Characterization of Crystal Quality by Crystal Originated Particle Delineation and the Impact on the Silicon Wafer Surface

1998 ◽  
Vol 145 (1) ◽  
pp. 275-284 ◽  
Author(s):  
D. Gräf ◽  
M. Suhren ◽  
U. Lambert ◽  
R. Schmolke ◽  
A. Ehlert ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Crystal Quality ◽  
Wafer Surface ◽  
Silicon Wafer Surface ◽  
The Impact

Clean Silicon Wafer Surface by a Slight Etch Method

1988 ◽  
Author(s):  
Ritsuo Takizawa ◽  
Toshiro Nakanishi ◽  
Kouichirou Honda ◽  
Akira Ohsawa
Keyword(s):  
Silicon Wafer ◽  
Wafer Surface ◽  
Silicon Wafer Surface

Analysis of the Reactant Gas Flow and Heat Transfer on the Silicon Wafer Surface Arranged in a Row in Heating Furnace

2002 ◽  
Vol 2002 (0) ◽  
pp. 275-276
Author(s):  
Naoko SAITO ◽  
Kazushige KIKUTA ◽  
Yukio HISHINUMA ◽  
Takemi CHIKAHISA ◽  
Toshimitsu MIYATA ◽  
...  
Keyword(s):  
Heat Transfer ◽  
Silicon Wafer ◽  
Gas Flow ◽  
Heating Furnace ◽  
Wafer Surface ◽  
Flow And Heat Transfer ◽  
Silicon Wafer Surface
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