scholarly journals Special Issue: Diamond Thin Films. Recent Developments on CVD Diamond Growth.

Shinku ◽  
1994 ◽  
Vol 37 (7) ◽  
pp. 553-559
Author(s):  
Tadao INUZUKA
1989 ◽  
Vol 162 ◽  
Author(s):  
Y. Liou ◽  
A. Inspektor ◽  
R. Weimer ◽  
D. Knight ◽  
R. Messier

ABSTRACTDiamond thin films were deposited on different substrates at low temperatures (lowest temperature∼ 300°C, estimated) in a microwave plasma enhanced chemical vapor deposition (MPCVD) system. The deposited films were amorphous carbon or diamond films depending on the different gas mixtures used. The growth rate of diamond thin films was decreased by adding oxygen to the gas mixture. The addition of oxygen to the gas mixtures was found to be important for diamond growth at low temperatures. Different concentrations of oxygen have been added into the gas mixture. Without oxygen, the deposited films were white soots and easily scratched off. Increasing the oxygen input improved the quality of the Raman peaks and increased the film transpancy. The diamond films were also characterized by scanning electron microscopy (SEM).


2009 ◽  
Vol 1 (1) ◽  
pp. 609-613 ◽  
Author(s):  
S. Lani ◽  
C. Ataman ◽  
W. Noell ◽  
D. Briand ◽  
N. de Rooij

1995 ◽  
Vol 383 ◽  
Author(s):  
Jim Sizemore ◽  
R. J. Hohlfelder ◽  
J. J. Vlassak ◽  
W. D. Nix

ABSTRACTIt is shown that the blister testing technique can be used to measure the adhesion of thin films to their substrates. A brief discussion of blister test mechanics is presented here, leading to a simple equation relating adhesion to the height of the blister and the pressure causing it to grow. Blister test data for plasma-enhanced CVD diamond films on Si substrates have been analyzed using this relation. The tests show adhesion energies of 1.8– 2.6 J/m2.


1997 ◽  
Vol 172 (3-4) ◽  
pp. 404-415 ◽  
Author(s):  
J. Michler ◽  
J. Stiegler ◽  
Y. von Kaenel ◽  
P. Moeckli ◽  
W. Dorsch ◽  
...  

1997 ◽  
Vol 40 (4) ◽  
pp. 361-368 ◽  
Author(s):  
Huoping Xin ◽  
Chenglu Lin ◽  
Jianxin Wang ◽  
Shichang Zou ◽  
Xiaohong Shi ◽  
...  

1992 ◽  
Vol 7 (7) ◽  
pp. 1606-1609 ◽  
Author(s):  
Lee Chow ◽  
Alan Horner ◽  
Hooman Sakouri ◽  
Bahram Roughani ◽  
Swaminatha Sundaram

The morphology of typical CVD diamond thin films has been shown to be controlled by the concentration of methane during deposition. For example, for CH4 concentrations c < 0.4% the (111) faces dominate, while at 0.4% < c < 1.2% (100) faces dominate. Here we showed that the (100) oriented diamond films can be grown on top of the microcrystalline ball-like particles under suitable conditions. These (100) oriented diamond films are grown under the condition of 1.5% methane in hydrogen, substrate temperature of 680 °C–750 °C, and pressure of 30–80 Torr. The bombardment of the diamond thin films by ions in the plasma is believed to be an important factor for the formation of (100) oriented films on top of the ball-like particles. SEM, Raman, and x-ray techniques were used to characterize the deposited (100) oriented diamond thin films.


Sign in / Sign up

Export Citation Format

Share Document