Whisker Formation in Copper Electroplating

Author(s):  
Theresa Han ◽  
Eunin Cho ◽  
Jinwoo Heo ◽  
Seoung Jae Lee

Abstract In the manufacture of Printed Wiring Boards (PWB), unwelcome structures, such as nodules and whiskers can be formed during copper electroplating with copper sulfate. Copper (Cu) whiskers with lengths of up to a few hundred micrometers can lead to electrical shorts between layers or patterns. In this paper, we document factors that can affect the growth of Cu whiskers; decomposition of additives in the Cu electroplating solution, surface stress, acidic cleaner, and the ingredients of a dry film. Contaminants from outside of the electroplating bath and the ingredients of the dry film were shown as key components in the formation of Cu whiskers.

2002 ◽  
Vol 16 (01n02) ◽  
pp. 197-204 ◽  
Author(s):  
W. L. GOH ◽  
K. T. TAN ◽  
M. S. TSE ◽  
K. Y. LIU

A thin seed layer (usually deposited by PVD or CVD) is essential for the copper electroplating technology in ULSI metallizations. Electroless Cu deposition has been proposed as an alternative to the PVD or CVD Cu seed technology due to its conformal nature. The electroless (EL) Cu technology requires an activation or catalyzation (usually by HF/PdCl 2 solution) to initiate the deposition process. This paper reports on the effect of the HF/PdCl 2 activation on the electroless Cu film properties. The implications of the HF/PdCl2 activation method on electroless Cu role as seed layer for Cu electroplating are also discussed. Electroless Cu has a very conformal growth on the TiN/Ti substrate; with a deposition rate of 15 nm/min. Prolonged HF/PdCl 2 has a negative impact to the Cu (111) texture, roughness and resistivity. The RBS analysis show that only trace amount of Pd is incorporated into the electroless Cu film.


2017 ◽  
Vol 422 ◽  
pp. 475-481 ◽  
Author(s):  
Xi Zhang ◽  
Yan Xu ◽  
Yong Zhou ◽  
Yinyan Gong ◽  
Yongli Huang ◽  
...  

1990 ◽  
Vol 5 (2) ◽  
pp. 67-72
Author(s):  
Shozo MIZUMOTO ◽  
Hidemi NAWAFUNE ◽  
Tamao KOJIMA ◽  
Masaki HAGA ◽  
Keiji ARAI

2013 ◽  
Vol 529 ◽  
pp. 29-33 ◽  
Author(s):  
Nao Shinoda ◽  
Tetsuya Shimizu ◽  
Tso-Fu Mark Chang ◽  
Akinobu Shibata ◽  
Masato Sone

2003 ◽  
Vol 107 ◽  
pp. 1333-1336 ◽  
Author(s):  
E. Van Hullebusch ◽  
P. Chatenet ◽  
V. Deluchat ◽  
P. M. Chazal ◽  
D. Froissard ◽  
...  
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